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Etching

Etching is a broad term that is used to describe the removal of material from your sample. The sub categories may be helpful for narrowing down your search, and be aware that there may be more than one technique and/or tool that could be used for your process. 

  • Dry etching uses gaseous chemistries and plasma energy to etch materials from the sample. 
  • Wet etching uses liquid chemistries to etch materials from samples. 
  • Vapor etching uses HF Vapor to etch materials. It is primarily used to etch structures that would be damaged during the rinse and dry process in a standard wet etch.
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Processing Technique Equipment name & Badger ID Primary Materials Etched Location Link to Training
Dry Resist Removal, Dry Etching Technics Asher
technics
SNF Cleanroom Paul G Allen L107 Technics Asher Training
Inductively Coupled Plasma Etching (ICP) Lam Research TCP 9400 Poly Etcher
lampoly
SNF Cleanroom Paul G Allen L107 Lam Research TCP 9400 Poly Etcher Training
Inductively Coupled Plasma Etching (ICP) Oxford III-V etcher
Ox-35
SNF Cleanroom Paul G Allen L107 Oxford III-V etcher Training
Inductively Coupled Plasma Etching (ICP) Plasma Therm Versaline LL ICP Deep Silicon Etcher
PT-DSE
SNF Cleanroom Paul G Allen L107 Plasma Therm Versaline LL ICP Deep Silicon Etcher Training
Inductively Coupled Plasma Etching (ICP) Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
SNF Cleanroom Paul G Allen L107 Plasma Therm Versaline LL ICP Dielectric Etcher Training
Inductively Coupled Plasma Etching (ICP) Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
SNF Cleanroom Paul G Allen L107 Plasma Therm Versaline LL ICP Metal Etcher Training
Inductively Coupled Plasma Etching (ICP) STS Deep RIE Etcher
stsetch
SNF Cleanroom Paul G Allen L107 STS Deep RIE Etcher Training
Reactive Ion Etching (RIE) MRC Reactive Ion Etcher
mrc
SNF Cleanroom Paul G Allen L107 MRC Reactive Ion Etcher Training
Reactive Ion Etching (RIE) Oxford Dielectric Etcher
oxford-rie
SNF Cleanroom Paul G Allen L107 Oxford Dielectric Etcher Training
Reactive Ion Etching (RIE) Plasmaetch PE-50
plasma-etch
SNF Exfab Paul G Allen 155 Mavericks Plasmaetch PE-50 Training
Plasma Mode Etching, Reactive Ion Etching (RIE), Downstream/Remote Plasma Resist Removal Samco PC300 Plasma Etch System
samco
SNF Cleanroom Paul G Allen L107 Samco Training
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107 Wet Bench Flexcorr 1and2 and 3and4 Training
Dry Resist Removal, Dry Etching Technics Asher
technics
SNF Cleanroom Paul G Allen L107 Technics Asher Training
Silicon Oxide Wet Etching Wet Bench Clean_res-hf
wbclean_res-hf
SNF Cleanroom Paul G Allen L107 Wet Bench Clean Piranha/HF/Phosphoric Training
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107 Wet Bench Flexcorr 1and2 and 3and4 Training
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107 Wet Bench Flexcorr 1and2 and 3and4 Training
Acid or Base Wet Etching, Piranha Cleaning Wet Bench Flexcorr 2
wbflexcorr-2
SNF Cleanroom Paul G Allen L107 Wet Bench Flexcorr 1and2 and 3and4 Training
Acid or Base Wet Etching, Piranha Cleaning Wet Bench Flexcorr 3
wbflexcorr-3
SNF Cleanroom Paul G Allen L107 Wet Bench Flexcorr 1and2 and 3and4 Training
Acid or Base Wet Etching, Piranha Cleaning Wet Bench Flexcorr 4
wbflexcorr-4
SNF Cleanroom Paul G Allen L107 Wet Bench Flexcorr 1and2 and 3and4 Training
Silicon Nitride Wet Etching Wet Bench Clean_res- hotphos
wbclean_res-hotphos
SNF Cleanroom Paul G Allen L107 Wet Bench Clean Piranha/HF/Phosphoric Training

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