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Wet Resist Removal

Wet methods use either solvents or acids/bases to dissolve the resist in order to remove it from the substrate.

The wet bench you need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).

 

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Cleanliness Equipment name & Badger ID Location Image Overview Link to Training
Clean Wet Bench Clean_res-piranha
wbclean_res-piranha
SNF Cleanroom Paul G Allen L107

The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training
Flexible Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexible Solvents
wbflexsolv
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more

Wet Bench Flexible Solvents 1 and 2 Training
Flexible Wet Bench Flexible Solvents 1
wbflexsolv-1
SNF Cleanroom Paul G Allen L107
Wet Bench Flexible Solvents

The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects...Read more

Wet Bench Flexible Solvents 1 and 2 Training
Flexible Wet Bench Flexible Solvents 2
wbflexsolv-2
SNF Cleanroom Paul G Allen L107
Wet Bench Flexible Solvents

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more

Wet Bench Flexible Solvents 1 and 2 Training