Wet Resist Removal

Wet methods use either solvents or acids/bases to dissolve the resist in order to remove it from the substrate.

The wet bench you need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).

Cleanliness	Equipment name & Badger ID	Location	Overview	Link to Training
Clean	Wet Bench Clean_res-piranha wbclean_res-piranha	SNF Cleanroom Paul G Allen L107	The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more	Wet Bench Clean Piranha/HF/Phosphoric Training
Flexible	Wet Bench Flexcorr 1 wbflexcorr-1	SNF Cleanroom Paul G Allen L107	The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more	Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible	Wet Bench Flexible Solvents wbflexsolv	SNF Cleanroom Paul G Allen L107	The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more	Wet Bench Flexible Solvents 1 and 2 Training
Flexible	Wet Bench Flexible Solvents 1 wbflexsolv-1	SNF Cleanroom Paul G Allen L107	The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects...Read more	Wet Bench Flexible Solvents 1 and 2 Training
Flexible	Wet Bench Flexible Solvents 2 wbflexsolv-2	SNF Cleanroom Paul G Allen L107	The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more	Wet Bench Flexible Solvents 1 and 2 Training

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Techniques

Wet Resist Removal