Wet methods use either solvents or acids/bases to dissolve the resist in order to remove it from the substrate.
The wet bench you need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).
Cleanliness | Equipment name & Badger ID | Location | Image | Overview | Link to Training |
---|---|---|---|---|---|
Clean |
Wet Bench Clean_res-piranha wbclean_res-piranha |
SNF Cleanroom Paul G Allen L107 |
![]() |
The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more |
Wet Bench Clean Piranha/HF/Phosphoric Training |
Flexible |
Wet Bench Flexcorr 1 wbflexcorr-1 |
SNF Cleanroom Paul G Allen L107 |
![]() |
The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
Wet Bench Flexible Solvents wbflexsolv |
SNF Cleanroom Paul G Allen L107 |
![]() |
The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
SNF Cleanroom Paul G Allen L107 |
![]() |
The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects...Read more |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
SNF Cleanroom Paul G Allen L107 |
![]() |
The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more |
Wet Bench Flexible Solvents 1 and 2 Training |
Clean (Ge), Semiclean, Flexible |
Wet Bench Resist Strip wbresstrip-1 |
SNF Cleanroom Paul G Allen L107 | Wet Bench Resist Strip |