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Decontamination cleans are used to remove trace metals and particles from substrates. This step is required for post processing of wafers and pieces that have gone through KOH-etching, chemical-mechanical polishing (cmp), and the wafer saw. For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page.

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Cleanliness Equipment name & Badger ID Location Image Overview Link to Training
Clean Wet Bench Decontamination
SNF Cleanroom Paul G Allen L107

This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of...Read more

Wet Bench Decontamination Training
Flexible Wet Bench Flexcorr 1
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training