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Oxygen

Chemical Formula:

O₂

Gases Equipment Tabs

Etch Equipment Table

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched	Gases
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten	80% He/ 20%O₂ Ar CF₄ CHF₃ Cl₂ HBr He N₂ NF₃ O₂ SF₆
AMT Oxide Plasma Etcher amtetcher	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si SiN SiO₂ Resist	C SiC SiON PI	Ar CHF₃ NF₃ O₂ SF₆
Drytek 100 Plasma Etcher drytek2	All	SNF Cleanroom Paul G Allen L107	Si SiN Poly Silicon Resist	C SiO₂ PI	CF₄ CHClF₂ O₂ SF₆
Gasonics Aura Asher gasonics	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Resist	PI	O₂
Lam Research TCP 9400 Poly Etcher lampoly	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si Poly Silicon	Ge SiGe	80% He/ 20%O₂ C₂F₆ CF₄ Cl₂ HBr He N₂ O₂
Matrix Plasma Resist Strip matrix	Flexible	SNF Cleanroom Paul G Allen L107	Resist	PI	O₂
MRC Reactive Ion Etcher mrc	Flexible	SNF Cleanroom Paul G Allen L107	Metals Various Dielectrics	Metal oxides PI	Ar CHClF₂ CHF₃ O₂ SF₆
Oxford Dielectric Etcher oxford-rie	Flexible	SNF Cleanroom Paul G Allen L107	SiC SiN SiO₂ PI	C	Ar CF₄ CHF₃ N₂ O₂ SF₆
Oxford III-V etcher Ox-35	Flexible	SNF Cleanroom Paul G Allen L107	GaAs	AlGaN AlInP GaN InGaP InSb	Ar BCl₃ CH₄ Cl₂ H₂ HBr N₂ O₂ SF₆
Oxford PlasmaPro 80 - Reactive Ion etcher RIE: Oxford PlasmaPro 80 (at SNSF)			Si SiN SiO₂	C Ti TiN W PI	Ar CF₄ CHF₃ O₂ SF₆
Plasma Therm Versaline LL ICP Deep Silicon Etcher PT-DSE	Flexible	SNF Cleanroom Paul G Allen L107	Si		Ar C₄F₈ O₂ SF₆
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox	Flexible	SNF Cleanroom Paul G Allen L107	C SiC SiN SiO₂	Si based materials Various C-based	Ar C₄F₈ CF₄ CHF₃ H₂ He N₂ O₂
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL	Flexible	SNF Cleanroom Paul G Allen L107	Various		Ar BCl₃ CF₄ CH₄ Cl₂ N₂ O₂ SF₆
Samco PC300 Plasma Etch System samco	Flexible	SNF Cleanroom Paul G Allen L107	Resist	Si based materials dimethylpolysiloxane Si SiN SiO₂ SiON Various polymers PI Poly Silicon	CF₄ O₂ SF₆
STS Deep RIE Etcher stsetch	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si	Ge SiGe	C₄F₈ O₂ SF₆
Technics Asher technics	Flexible	SNF Cleanroom Paul G Allen L107	Resist	dimethylpolysiloxane poly(p-xylylene) PI	O₂

Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aw610_l aw610_l	Clean	SNF Cleanroom Paul G Allen L107
Aw610_r aw610_r	Flexible	SNF Cleanroom Paul G Allen L107
Fiji 1 fiji1	Semiclean	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Metal oxides Al₂O₃ HfN HfO₂ Pt Ru SiO₂ Ta₂O₅ TaN TiN TiO₂ Various Dielectrics ZrO₂
Fiji 2 fiji2	Flexible	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Metal oxides Al₂O₃ Ga₂O₃ HfN HfO₂ In₂O₃ In_xSn_yO_z MoO₃ Ni_xO_y Pt Ru SiN SiO₂ SnO₂ SrO Ta₂O₅ TiN TiO₂ Various Dielectrics ZrO₂
Fiji 3 fiji3	Flexible	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Al₂O₃ HfO₂ SiO₂ TiO₂ Various Dielectrics
First Nano carbon nanotube CVD furnace cvd-nanotube	Flexible	SNF Exfab Paul G Allen L119 Año Nuevo		C
Lesker2 Sputter lesker2-sputter	Semiclean	SNF Cleanroom Paul G Allen L107	1 μm	Ag Al Al₂O₃ AlSi Cr Ge In_xSn_yO_z Mo Pd Ru Sc Si SiO₂ Sn Ta Ti TiN W
PlasmaTherm Versaline HDP CVD System hdpcvd	All	SNF Cleanroom Paul G Allen L107	500 Å - 4 μm
STS Plasma Enhanced CVD sts	Flexible	SNF Cleanroom Paul G Allen L107	100 Å - 5 μm
Teos2 teos2	Clean	SNF Cleanroom Paul G Allen L107	50 Å - 5 μm	SiO₂
Thermco1 thermco1	Clean	SNF Cleanroom Paul G Allen L107	25 Å - 2 μm	SiO₂
Thermco3 thermco 3	Clean	SNF Cleanroom Paul G Allen L107	25 Å - 2 μm	SiO₂
Thermco4 thermco4	Flexible	SNF Cleanroom Paul G Allen L107	25 Å - 2 μm	SiO₂
ThermcoLTO thermcoLTO	Flexible	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	SiO₂
Tylan9 tylan9	Flexible	SNF Cleanroom Paul G Allen L107
TylanBPSG tylanbpsg	Clean Semiclean	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	SiO₂