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Stanford Nanofabrication Facility
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Diamond
Chemical Formula:
C
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Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
Oxford Dielectric Etcher
oxford-rie
Flexible
SNF Cleanroom Paul G Allen L107
SiC
SiN
SiO
2
PI
C
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Flexible
SNF Cleanroom Paul G Allen L107
C
SiC
SiN
SiO
2
Si based materials
Various C-based
Projects
Fabrication and Hall Measurements of Hydrogen-Terminated Diamond 2DHG Devices