Silicon Nitride Wet Etching
Heated phosphoric acid is used for removal of silicon nitrides.
| Equipment name & Badger ID | Location | Image | Overview | Primary Materials Etched | Link to Training |
|---|---|---|---|---|---|
|
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
SNF Cleanroom Paul G Allen L107 |
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The wbclean_res-hotphos is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of...Read more |
Wet Bench Clean Piranha/HF/Phosphoric Training |
