|
Silicon Nitride Wet Etching |
Wet Bench Clean_res- hotphos (wbclean_res-hotphos) |
85% Phosphoric Acid |
Silicon Nitride |
|
Clean |
Resist should have been removed
|
|
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching |
Wet Bench Flexcorr 1 (wbflexcorr-1) |
Acids, 20:1 Buffered oxide etch, 6:1 Buffered oxide etch, 85% Phosphoric Acid, 9:1 Piranha Solution, 50:1 Hydrofluoric Acid, Standard Clean 1, Standard Clean 2, Aluminum Etchant, Chromium Etchant, Gold Etchant, Bases, Potassium Hydroxide 45% |
Photoresist, Metals, Silicon Dioxide, Silicon, Aluminum, Chromium, Gold |
|
Flexible |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
|
|
Acid or Base Wet Etching, Piranha Cleaning |
Wet Bench Flexcorr 2 (wbflexcorr-2) |
Acids, Bases |
|
|
Flexible |
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only
|
|
Aluminum and Titanium and Tungsten Wet Etching |
Wet Bench CMOS Metal (wbclean3) (wbclean3) |
20:1 Buffered oxide etch, 6:1 Buffered oxide etch, 50:1 Hydrofluoric Acid, Aluminum Etchant, Titanium (Ti) etchant Peroxide-based, Tungsten (W) etchant Peroxide-based |
Aluminum, Titanium, Tungsten |
|
Semiclean |
Al, Ti, or W wet etching or oxide etching
|
|
Resist Develop (manual) |
Wet Bench Miscellaneous (wbmiscres) |
Developers |
|
|
Flexible |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!
|
|
Mask Cleaning (manual) |
Mask Scrubber (masksrub) |
DI Water |
|
|
All |
5 inch mask cleaning, water under pressure, no chemicals
|
|
Wet Resist Removal |
Wet Bench Resist Strip (wbresstrip-1) |
PRS-1000, SRS-100 |
Photoresist |
|
Clean (Ge), Semiclean, Flexible |
Wet Resist Removal: SRS-100 or PRS1000
|
|
Silicon Oxide Wet Etching |
Wet Bench Clean_res-hf (wbclean_res-hf) |
20:1 Buffered oxide etch, 6:1 Buffered oxide etch, 50:1 Hydrofluoric Acid |
Silicon Dioxide |
|
Clean |
Resist as mask allowed
|
|
Acid or Base Wet Etching, Piranha Cleaning |
Wet Bench Flexcorr 4 (wbflexcorr-4) |
Acids, Bases |
|
|
Flexible |
Manual wet etching of non-standard materials using acids or bases. Hot plate, HF bath, and controlled temperature bath available. GaAs not allowed.
|
|
Solvent Cleaning, Wet Resist Removal |
Wet Bench Flexible Solvents 1 (wbflexsolv-1) |
Solvents |
|
|
Flexible |
Manual solvent cleaning, two ultrasonic baths.
|
|
Solvent Cleaning, Wet Resist Removal |
Wet Bench Flexible Solvents 2 (wbflexsolv-2) |
Solvents |
|
|
Flexible |
Manual solvent cleaning, hot plate
|
|
Decontamination |
Wet Bench Decontamination (wbdecon) |
Standard Clean 2 |
|
|
Clean |
KOH or wafersaw or post-cmp decontamination
|
|
Solvent Cleaning |
Lithography Solvent Bench (lithosolv) |
Solvents |
|
|
Flexible |
Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
|
|
Piranha Cleaning, Wet Resist Removal |
Wet Bench Clean_res-piranha (wbclean_res-piranha) |
9:1 Piranha Solution |
|
|
Clean |
Resist will be removed
|
|
Acid or Base Wet Etching, Piranha Cleaning |
Wet Bench Flexcorr 3 (wbflexcorr-3) |
Acids, Bases |
|
|
Flexible |
Manual wet etching of non-standard materials using acids or bases. Hot Plate available. GaAs not allowed.
|
|
Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Wet Bench Flexible Solvents (wbflexsolv) |
Solvents |
|
|
Flexible |
Manual solvent cleaning of substrates or resist removal.
|
|
CO2 Drying |
Tousimis Automegasamdri-915B Critical Point Dryer (cpd) |
CO2 (liquid) |
|
|
Flexible |
CO2 drying after release of micromachined devices
|
|
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean |
Wet Bench Clean 1 (wbclean-1) |
50:1 Hydrofluoric Acid, Standard Clean 1, Standard Clean 2 |
|
|
Clean |
No resist allowed. Resist should have been removed at the wbclean_res-piranha.
|
|
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean |
Wet Bench Clean 2 (wbclean-2) |
6:1 Buffered oxide etch, 50:1 Hydrofluoric Acid, Standard Clean 1, Standard Clean 2 |
|
|
Clean |
No resist allowed. Resist should have been removed at the wbclean_res-piranha
|
|
Solvent Cleaning, Metal Lift-off |
Ex Fab Solvent Wet Bench (wbexfab_solv) |
Solvents |
|
|
Flexible |
|
