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50:1 Hydrofluoric Acid

Preferred Short Name: 
50:1 HF
Chemical Formula: 
50:1 HF
Full Chemical Name (for In-Use Hazardous Chemicals card): 
50:1 Hydrofluoric Acid (~2%)

50:1 HF is typically used as an oxide etchant.

Partial words okay.
Equipment name & Badger ID Training Required & Charges Cleanliness Location Chemicals Notes
Wet Bench Clean 1
wbclean-1
Wet Bench Clean1and2 Training
2.00 hours
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha.

Wet Bench Clean 2
wbclean-2
Wet Bench Clean1and2 Training
2.00 hours
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha

Wet Bench Clean_res-hf
wbclean_res-hf
Wet Bench Clean Piranha/HF/Phosphoric Training
2.25 hours
SNF Cleanroom Paul G Allen L107

Resist as mask allowed

Wet Bench CMOS Metal
wbclean3
Wet Bench CMOS Metal (wbclean3) Training SNF Cleanroom Paul G Allen L107

Al, Ti, or W wet etching or oxide etching

Wet Bench Flexcorr 1
wbflexcorr-1
Wet Bench Flexcorr 1and2 and 3and4 Training
2.00 hours
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.

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