50:1 HF is typically used as an oxide etchant.
No resist allowed. Resist should have been removed at the wbclean_res-piranha.
No resist allowed. Resist should have been removed at the wbclean_res-piranha
Resist as mask allowed
Al, Ti, or W wet etching or oxide etching
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Clean Germanium wafers only: Pre-Diffusion Clean