50:1 Hydrofluoric Acid
Preferred Short Name:
50:1 HF
Chemical Formula:
50:1 HF
Full Chemical Name (for In-Use Hazardous Chemicals card):
50:1 Hydrofluoric Acid (~2%)
50:1 HF is typically used as an oxide etchant.
| Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
|---|---|---|---|---|---|
|
Wet Bench Clean 1 wbclean-1 |
Wet Bench Clean 1 and 2 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha. |
||
|
Wet Bench Clean 2 wbclean-2 |
Wet Bench Clean 1 and 2 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha |
||
|
Wet Bench Clean_res-hf wbclean_res-hf |
Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Resist as mask allowed |
||
|
Wet Bench CMOS Metal (wbclean3) wbclean3 |
Wet Bench CMOS Metal (wbclean3) Training | SNF Cleanroom Paul G Allen L107 |
Al, Ti, or W wet etching or oxide etching |
||
|
Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only. |
