MERIE, Magnetically Enhanced Reactive Ion Etching, is where a magnetic field is applied in a capacitively coupled plasma etcher. Applied magnetic field enhances the etch rate while reducing the bias voltage simultaneously for a given RF power setting. A rotating magnetic field is generated by varying the current between the four electromagnetic coils placed around the electrode.
Equipment name & Badger ID | Location | Image | Overview | Primary Materials Etched | Link to Training |
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AMAT P5000 Etcher p5000etch |
SNF Cleanroom Paul G Allen L107 |
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P5000 is a load-locked, magnetically enhanced reactive ion etching system (MERIE) with two functional process...Read more |
AMAT P5000 Etcher Training |