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Magnetically Enhanced RIE (MERIE)

MERIE, Magnetically Enhanced Reactive Ion Etching, is where a magnetic field is applied in a capacitively coupled plasma etcher.  Applied magnetic field enhances the etch rate while reducing the bias voltage simultaneously for a given RF power setting.  A rotating magnetic field is generated by varying the current between the four electromagnetic coils placed around the electrode.    

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Equipment name & Badger ID Location Image Overview Primary Materials Etched Link to Training
AMAT P5000 Etcher
SNF Cleanroom Paul G Allen L107

P5000 is a load-locked, magnetically enhanced reactive ion etching system (MERIE) with two functional process...Read more

AMAT P5000 Etcher Training