Skip to content Skip to navigation

Flexible

The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy.

The following is a list of equipment that fall into the "Flexible" category.

Subscribe to
Equipment name & Badger ID Training Required & Charges Cleanliness Location Notes
AFM-Asylum
afm-asylum
AFM-Asylum Training Flexible SNF Exfab Paul G Allen 151 Ocean
Aixtron Black Magic graphene CVD furnace
aixtron-graphene
Aixtron Black Magic graphene CVD furnace training Flexible SNF Exfab Paul G Allen L119 Año Nuevo
Aixtron MOCVD - III-V system
aix200
Aixtron MOCVD - III-V system training Flexible SNF MOCVD Paul G Allen 213XA

N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.

AJA Evaporator
aja-evap
AJA Evaporation training Flexible SNF Exfab Paul G Allen 155A Venice

For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance

AllWin 610 RTA (aw610_r)
aw610_r
AllWin 610 RTA Training Flexible SNF Cleanroom Paul G Allen L107
Alphastep 500 Profilometer
alphastep
Alphastep 500 Profilometer Training Flexible SNF Exfab Paul G Allen 104 Stinson

500Å to 300µm

Alveole Primo
alveole
Alveole Primo Training Flexible SNF Exfab Paul G Allen 151 Ocean
Biologic SP-300
biologic
BioLogic Potentiostat Training Flexible SNF Exfab Paul G Allen 155 Mavericks
CytoViva HSI
cytoviva
Cytoviva Training Flexible SNF Exfab Paul G Allen 151 Ocean
DISCO Backgrinder
disco-backgrind
DISCO Backgrinder Training Flexible SNF Exfab Paul G Allen 159 Capitola
DISCO Wafer Saw
DISCO wafersaw
DISCO wafersaw training Flexible SNF Exfab Paul G Allen 159 Capitola
Epilog Fusion M2 Laser Cutter
lasercutter
Lasercutter Training Flexible SNF Exfab Paul G Allen 155A Venice
EV Group Wafer Bonder
evbond
EV Group Wafer Bonder Training Flexible SNF Cleanroom Paul G Allen L107
Ex Fab Develop Wet Bench
wbexfab_dev
WbExfab_Dev Training Flexible SNF Exfab Paul G Allen 104 Stinson

Manual development of resist in beakers. SNF approved developers only. No solvents!

Ex Fab Solvent Wet Bench
wbexfab_solv
WbExfab_Solv Training Flexible SNF Exfab Paul G Allen 104 Stinson
Fiji 2 ALD
fiji2
Fiji 1 and 2 ALD Training Flexible SNF Cleanroom Paul G Allen L107
Fiji 3 ALD
fiji3
Fiji 3 ALD Training Flexible SNF Cleanroom Paul G Allen L107

Restricted to non-conductive films only

Finetech Lambda
flipchipbonder
Flip Chip Bonder Training Flexible SNF Exfab Paul G Allen 104 Stinson
First Nano carbon nanotube CVD furnace
cvd-nanotube
cvd-nanotube training Flexible SNF Exfab Paul G Allen L119 Año Nuevo

Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density

Fisher Accuspin 24C
centrifuge
Centrifuge Training Flexible SNF Exfab Paul G Allen 155 Mavericks

Pages

Equipment name & Badger ID Technique Cleaning Required Cleanliness Material Thickness Range Materials Lab Supplied Developer Process Temperature Range Chemicals Gases Substrate Size Substrate Type Maximum Load
AFM-Asylum
afm-asylum
Flexible
Aixtron Black Magic graphene CVD furnace
aixtron-graphene
Flexible
800 °C - 1100 °C
,
1x4" wafer or Copper/Nickel foil
Aixtron MOCVD - III-V system
aix200
Pre-Diffusion Clean Flexible
0.00 - 5.00 μm
300 °C - 800 °C
,
,
,
4"x1 wafer or 2"x1 wafer or 4 pieces
AJA Evaporator
aja-evap
Flexible
0.00 - 300.00 nm
,
,
,
,
,
,
,
,
,
,
,
4"x3 or 6"x1 wafers or pieces
AllWin 610 RTA (aw610_r)
aw610_r
Flexible
21 °C - 1150 °C
,
,
Alphastep 500 Profilometer
alphastep
Flexible ,
,
,
,
,
,
,
,
1
Alveole Primo
alveole
Flexible
Biologic SP-300
biologic
Flexible
CytoViva HSI
cytoviva
Flexible
DISCO Backgrinder
disco-backgrind
Flexible
DISCO Wafer Saw
DISCO wafersaw
Flexible ,
,
,
,
,
,
,
,
1x4", 1x6" or 1x8" wafer, or pieces
Epilog Fusion M2 Laser Cutter
lasercutter
Flexible
EV Group Wafer Bonder
evbond
Flexible ,
,
,
,
,
Ex Fab Develop Wet Bench
wbexfab_dev
Flexible
Ex Fab Solvent Wet Bench
wbexfab_solv
Flexible
Fiji 2 ALD
fiji2
Flexible
1.00 Å - 50.00 nm
24 °C - 350 °C
,
,
,
,
,
,
,
,
,
,
,
,
Fiji 3 ALD
fiji3
Flexible
1.00 Å - 50.00 nm
24 °C - 350 °C
,
,
Finetech Lambda
flipchipbonder
Flexible
°C - 400 °C
,
,
,
,
,
1
First Nano carbon nanotube CVD furnace
cvd-nanotube
Flexible
800 °C - 1100 °C
,
1x4" wafer or multiple pieces
Fisher Accuspin 24C
centrifuge
Flexible

Pages