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Flexible

The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "Flexible" category.

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Equipment name & Badger ID Training Required & Charges Cleanliness Lab Organization Location Notes
AFM-Asylum
afm-asylum
AFM-Asylum Training Flexible
SNF
SNF Exfab Paul G Allen 151 Ocean
Aix200
aix200
Aixtron MOCVD - III-V system training Flexible
SNF
SNF MOCVD Paul G Allen 213XA

N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.

Aixtron Black Magic graphene CVD furnace
aixtron-graphene
Aixtron Black Magic graphene CVD furnace training Flexible
SNF
SNF Exfab Paul G Allen L119 Año Nuevo
AJA Evaporator
aja-evap
AJA Evaporation training Flexible
SNF
SNF Exfab Paul G Allen 155A Venice

For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance

Alphastep 500 Profilometer
alphastep
Alphastep 500 Profilometer Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

500Å to 300µm

Alveole Primo
alveole
Alveole Primo Training Flexible
SNF
SNF Exfab Paul G Allen 151 Ocean
Aw610_r
aw610_r
AllWin 610 RTA Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
Biologic SP-300
biologic
Bio-Logic Potentiostat Training Flexible SNF Exfab Paul G Allen 155 Mavericks
Blue M Oven
bluem
Blue M Oven Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Convection in N2. Cure. Programmable.

Critical Point Dryer
cpd
Critical Point Dryer Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

CO2 drying after release of micromachined devices

CytoViva HSI
cytoviva
Cytoviva Training Flexible
SNF
SNF Exfab Paul G Allen 151 Ocean
DISCO Backgrinder
disco-backgrind
DISCO Backgrinder Training Flexible
SNF
SNF Exfab Paul G Allen 159 Capitola
DISCO Wafer Saw
DISCO wafersaw
DISCO wafersaw training Flexible
SNF
SNF Exfab Paul G Allen 159 Capitola
Ebeam Process Wet Bench
wbebres
Ebeam Process Wet Bench Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Manual developing of Ebeam resist

Epilog Fusion M2 Laser Cutter
lasercutter
Lasercutter Training Flexible
SNF
SNF Exfab Paul G Allen 155A Venice
EV Group Wafer Bonder
evbond
EV Group Wafer Bonder Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
Ex Fab Develop Wet Bench
wbexfab_dev
WbExfab_Dev Training Flexible
SNF
SNF Exfab Paul G Allen 104 Stinson
Ex Fab Solvent Wet Bench
wbexfab_solv
WbExfab_Solv Training Flexible
SNF
SNF Exfab Paul G Allen 104 Stinson
Fiji 2
fiji2
Fiji 1 and 2 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
Fiji 3
fiji3
Fiji 3 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Restricted to non-conductive films only

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Equipment name & Badger ID Technique Cleaning Required Cleanliness Material Thickness Range Materials Lab Supplied Minimum Resolution Objective Separation Process Temperature Range Chemicals Gases Substrate Size Substrate Type Maximum Load
AFM-Asylum
afm-asylum
Flexible
Aix200
aix200
Pre-Diffusion Clean, Special: See Notes Flexible
0 - 5 μm
300 °C - 800 °C
,
,
,
4"x1 wafer or 2"x1 wafer or 4 pieces
Aixtron Black Magic graphene CVD furnace
aixtron-graphene
Flexible
800 °C - 1100 °C
,
1x4" wafer or Copper/Nickel foil
AJA Evaporator
aja-evap
Flexible
0 - 300 nm
,
,
,
,
,
,
,
,
,
,
,
4"x3 or 6"x1 wafers or pieces
Alphastep 500 Profilometer
alphastep
Flexible
,
,
,
,
,
,
,
,
1
Alveole Primo
alveole
Flexible
Aw610_r
aw610_r
Flexible
21 °C - 1150 °C
,
,
Biologic SP-300
biologic
Flexible
Blue M Oven
bluem
Flexible
0 °C - 430 °C
,
,
,
,
,
,
,
,
,
Critical Point Dryer
cpd
Flexible
,
,
,
,
,
,
,
,
,
CytoViva HSI
cytoviva
Flexible
DISCO Backgrinder
disco-backgrind
Flexible
DISCO Wafer Saw
DISCO wafersaw
Flexible
,
,
,
,
,
,
,
,
1x4", 1x6" or 1x8" wafer, or pieces
Ebeam Process Wet Bench
wbebres
Flexible
Epilog Fusion M2 Laser Cutter
lasercutter
Flexible
EV Group Wafer Bonder
evbond
Flexible
,
,
,
,
,
Ex Fab Develop Wet Bench
wbexfab_dev
Flexible
Ex Fab Solvent Wet Bench
wbexfab_solv
Flexible
Fiji 2
fiji2
Flexible
1 Å - 50 nm
24 °C - 350 °C
,
,
,
,
,
,
,
,
,
,
,
,
Fiji 3
fiji3
Flexible
1 Å - 50 nm
24 °C - 350 °C
,
,

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