Silicon Nitride

Chemical Formula:

Si3N4

Deposited Silicon Nitride (commonally called "nitride') is used as an isulator in traditional semiconductors, a masking layer or a stuctural layer in some mechanical applications.
LPCVD: Thermco Nitride Deposition Furnace
or
PECVD:
Low stress Silicon nitride is deposited in the PlasmaTherm Shuttlelock PECVD System (ccp-dep) by the reaction between silane (5% Silane in He) and nitrogen.
In the HDPCVD system, 100% silane and N2 are the reactants to produce silicon nitride film.
or
ALD: atomic layer deposition

Link to Silicon Nitride Wet Etching Technique

Equipment Tabs

Deposition Equipment

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Fiji 2 ALD fiji2	Flexible	SNF Cleanroom Paul G Allen L107	1.00 Å - 50.00 nm	Metal oxides Al₂O₃ Ga₂O₃ HfN HfO₂ In₂O₃ In_xSn_yO_z MoO₃ Ni_xO_y Pt Ru Si3N4 SiO₂ SnO₂ SrO Ta₂O₅ TiN TiO₂ Various Dielectrics ZrO₂
PlasmaTherm Shuttlelock PECVD System ccp-dep	All	SNF Cleanroom Paul G Allen L107	100.00 Å - 4.00 μm	Si Si3N4 SiC SiO₂ SiON
PlasmaTherm Versaline HDP CVD System hdpcvd	All	SNF Cleanroom Paul G Allen L107	500.00 Å - 4.00 μm	Si Si3N4 SiC SiO₂ SiON
Thermco Nitride Deposition Furnace LPCVD thermconitride1	Clean	SNF Cleanroom Paul G Allen L107	100.00 Å - 2.00 μm	Si3N4

Etching Equipment

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si Si3N4 SiGe SiO₂ SiON	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten
Oxford Dielectric Etcher oxford-rie	Flexible	SNF Cleanroom Paul G Allen L107	Si3N4 SiC SiO₂ PI	C
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox	Flexible	SNF Cleanroom Paul G Allen L107	C Si3N4 SiC SiO₂	Various C-based
Samco PC300 Plasma Etch System samco	Flexible	SNF Cleanroom Paul G Allen L107	Resist	dimethylpolysiloxane Si Si3N4 SiO₂ SiON Various polymers PI
Wet Bench Clean_res- hotphos wbclean_res-hotphos	Clean	SNF Cleanroom Paul G Allen L107	Si3N4
Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W

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Silicon Nitride

Equipment Tabs