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Silicon Nitride

Chemical Formula:

SiN

Equipment Tabs

Deposition Equipment

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Fiji 2 fiji2	Flexible	SNF Cleanroom Paul G Allen L107	1 Å - 50 nm	Metal oxides Al₂O₃ Ga₂O₃ HfN HfO₂ In₂O₃ In_xSn_yO_z MoO₃ Ni_xO_y Pt Ru SiN SiO₂ SnO₂ SrO Ta₂O₅ TiN TiO₂ Various Dielectrics ZrO₂
ThermcoNitride thermconitride1	Clean	SNF Cleanroom Paul G Allen L107	100 Å - 2 μm	SiN

Etch Equipment

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten
AMT Oxide Plasma Etcher amtetcher	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Si SiN SiO₂ Resist	C SiC SiON PI
Drytek 100 Plasma Etcher drytek2	All	SNF Cleanroom Paul G Allen L107	Si SiN Poly Silicon Resist	C SiO₂ PI
Oxford Dielectric Etcher oxford-rie	Flexible	SNF Cleanroom Paul G Allen L107	SiC SiN SiO₂ PI	C
Oxford PlasmaPro 80 - Reactive Ion etcher RIE: Oxford PlasmaPro 80 (at SNSF)			Si SiN SiO₂	C Ti TiN W PI
Plasma Therm Versaline LL ICP Dielectric Etcher PT-Ox	Flexible	SNF Cleanroom Paul G Allen L107	C SiC SiN SiO₂	Si based materials Various C-based
Samco PC300 Plasma Etch System samco	Flexible	SNF Cleanroom Paul G Allen L107	Resist	Si based materials dimethylpolysiloxane Si SiN SiO₂ SiON Various polymers PI Poly Silicon
Wet Bench Clean_res- hotphos wbclean_res-hotphos	Clean	SNF Cleanroom Paul G Allen L107	SiN

Projects