Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
SNF is open under
New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Techniques
Overview
Processing Techniques
Projects
Nano Nuggets
Processes
Runsheets
Safety
Overview
New Normal
Safety Policies
Safety Training
SDS
Camera Policies
Training
Overview
Training Calendar
Training Course Online
Training Shadowing Form
Training Videos
Materials
Overview
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Useful Links
Overview
Wafer Dopant and Resistivity Specs
SNF Badger Accounts
Events
News
Discussion Lists*
Community Bulletin Board
External Links
Archive of previous wiki
Contacts*
Equipment
Equipment Table
Characterization Equipment
CVD Equipment
Doping Equipment
Dry Etch Equipment
Metallization Equipment
Photolithography Equipment
Wet Bench Equipment
New Normal Policies
Materials
Overview
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Tungsten Silicide
Chemical Formula:
WSi
2
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Etch Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
