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Stanford Nanofabrication Facility
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1.0 General Policies
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Face shield cleaning using steamer
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Tungsten Silicide
Chemical Formula:
WSi
2
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Etching Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
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Cleanliness
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AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si
Si3N4
SiGe
SiO
2
SiON
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
