SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Objective Separation | Process Temperature Range | Chemicals | Gases | Accessories Available | Substrate Size | Substrate Type | Maximum Load |
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Ex Fab Develop Wet Bench wbexfab_dev |
Flexible |
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Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible |
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Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls |
Flexible |
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Integrating Sphere |
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PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Flexible |
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Samco PC300 Plasma Etch System samco |
Flexible |
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20 ºC
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Four 4" wafers or two 6" wafers and one 8" wafer |