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Downstream/Remote Plasma Etching

Remote plasma etching or downstream plasma etching refers to the configuration wherein plasma is generated remotely relative to the process chamber and only the reactive species produced by the plasma reach the process chamber.  This technique produces minimal surface damage at the substrate level and is used for plasma resist removal, surface cleaning and activation.  In resist strip processes, the substrate is typically heated to enhance the reaction rate.

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Equipment name & Badger ID Location Image Overview Primary Materials Etched Link to Training
Gasonics Aura Asher
SNF Cleanroom Paul G Allen L107

The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist...Read more

Gasonics Aura Asher Training
Matrix Plasma Resist Strip
SNF Cleanroom Paul G Allen L107
photo of matrix in SNF cleanroom

The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination...Read more

Matrix Plasma Resist Strip Training