SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
BOE (Buffered Oxide Etch) is an HF based etchant, typically used to etch oxides. The buffer helps to reduce the impact to resist during etching.
Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
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Wet Bench Clean_res-hf wbclean_res-hf |
Wet Bench Clean Piranha/HF/Phosphoric Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Resist as mask allowed |
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Wet Bench CMOS Metal (wbclean3) wbclean3 |
Wet Bench CMOS Metal (wbclean3) Training | SNF Cleanroom Paul G Allen L107 |
Al, Ti, or W wet etching or oxide etching |
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Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only. |