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Clean (Ge)

The "Clean (Ge)" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "Clean (Ge)" category.

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Equipment name & Badger ID Technique Cleanliness Primary Materials Etched Other Materials Etched Material Thickness Range Minimum Resolution Objective Separation Process Temperature Range Chemicals Gases Substrate Size Substrate Type Maximum Load
AMAT P5000 Etcher
p5000etch
Clean, Clean (Ge), Semiclean
Wet Bench Germanium
wbgen2
Clean (Ge)
25