Wet Etching

Wet etching refers to processes that use liquid chemicals to remove materials from samples. Important considerations for wet etching processes are the isotropic nature of the etch and it's impact to your desired pattern, the selectivity (ratio of etch rates between materials you want to remove and other materials that will be exposed to the etchant), and chemical safety. When selecting which equipment to use, you will need to consider the type of chemical, the size and shape of your sample, and the Cleanliness (formerly known as Contamination) group.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & Badger ID	Cleanliness	Location
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Silicon Oxide Wet Etching	Wet Bench Clean_res-hf wbclean_res-hf	Clean	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 2 wbflexcorr-2	Flexible	SNF Cleanroom Paul G Allen L107
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 3 wbflexcorr-3	Flexible	SNF Cleanroom Paul G Allen L107
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 4 wbflexcorr-4	Flexible	SNF Cleanroom Paul G Allen L107
Silicon Nitride Wet Etching	Wet Bench Clean_res- hotphos wbclean_res-hotphos	Clean	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Aluminum and Titanium and Tungsten Wet Etching	Wet Bench CMOS Metal (wbclean3) wbclean3	Semiclean	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 2 wbflexcorr-2	Flexible	SNF Cleanroom Paul G Allen L107
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 3 wbflexcorr-3	Flexible	SNF Cleanroom Paul G Allen L107
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 4 wbflexcorr-4	Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & Badger ID	Cleanliness	Chemicals	Primary Materials Etched	Other Materials Etched	Substrate Size	Maximum Load (number of wafers)	Notes
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Silicon Oxide Wet Etching	Wet Bench Clean_res-hf wbclean_res-hf	Clean	20:1 BOE 50:1 HF 6:1 BOE	SiO₂		3" 4" 6"		Resist as mask allowed
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 2 wbflexcorr-2	Flexible	Acids Bases			Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. 3 hot pots available. GaAs allowed in personal labware only
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 3 wbflexcorr-3	Flexible	Acids Bases			Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot Plate available. GaAs not allowed.
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 4 wbflexcorr-4	Flexible	Acids Bases			Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. CTB. Labware for "clean" KOH or TMAH etching available. GaAs not allowed.
Silicon Nitride Wet Etching	Wet Bench Clean_res- hotphos wbclean_res-hotphos	Clean	H₃PO₄	Si3N4		3" 4" 6"		Resist should have been removed
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Aluminum and Titanium and Tungsten Wet Etching	Wet Bench CMOS Metal (wbclean3) wbclean3	Semiclean	20:1 BOE 50:1 HF 6:1 BOE Al-Etch Ti-Etch W-etch	Al Ti W		3" 4" 6"	25 wafers	Al, Ti, or W wet etching or oxide etching
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 2 wbflexcorr-2	Flexible	Acids Bases			Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. 3 hot pots available. GaAs allowed in personal labware only
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 3 wbflexcorr-3	Flexible	Acids Bases			Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot Plate available. GaAs not allowed.
Acid or Base Wet Etching, Piranha Cleaning	Wet Bench Flexcorr 4 wbflexcorr-4	Flexible	Acids Bases			Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. CTB. Labware for "clean" KOH or TMAH etching available. GaAs not allowed.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W	Pieces 2" 3" 4" 6"		Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.

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Wet Etching

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