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Face shield cleaning using steamer
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Perfluoroethane
Chemical Formula:
C
2
F
6
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
Lam Research TCP 9400 Poly Etcher
lampoly
Clean
Semiclean
SNF Cleanroom Paul G Allen L107
Si
Poly Silicon
Ge
SiGe
80% He/ 20%O
2
C
2
F
6
CF
4
Cl
2
HBr
He
N
2
O
2
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
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