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Downstream/Remote Plasma Resist Removal

Downstream or remote plasma resist removal (also known as ashing) generates the plasma gases outside of the process chamber in order to minimize bombardment of the substrate surface.

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Cleanliness Equipment name & Badger ID Location Image Overview Link to Training
Clean, Semiclean Gasonics Aura Asher
gasonics
SNF Cleanroom Paul G Allen L107

The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist of clean 4 inch wafers...Read more

Gasonics Aura Asher Training
Flexible Matrix Plasma Resist Strip
matrix
SNF Cleanroom Paul G Allen L107
photo of matrix in SNF cleanroom

The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power,...Read more

Matrix Plasma Resist Strip Training
Flexible Samco PC300 Plasma Etch System
samco
SNF Cleanroom Paul G Allen L107
Samco Training