Downstream/Remote Plasma Resist Removal
Downstream or remote plasma resist removal (also known as ashing) generates the plasma gases outside of the process chamber in order to minimize bombardment of the substrate surface.
| Cleanliness | Equipment name & Badger ID | Location | Image | Overview | Link to Training |
|---|---|---|---|---|---|
| Clean, Semiclean |
Gasonics Aura Asher gasonics |
SNF Cleanroom Paul G Allen L107 |
 |
The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist of clean 4 inch wafers...Read more |
Gasonics Aura Asher Training |
| Flexible |
Matrix Plasma Resist Strip matrix |
SNF Cleanroom Paul G Allen L107 |
 |
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power,...Read more |
Matrix Plasma Resist Strip Training |
| Flexible |
Samco PC300 Plasma Etch System samco |
SNF Cleanroom Paul G Allen L107 |
 |
Samco Training |
