Downstream/Remote Plasma Resist Removal
Downstream or remote plasma resist removal (also known as ashing) generates the plasma gases outside of the process chamber in order to minimize bombardment of the substrate surface.
Technique Tabs Main Tab
Processing Techniques
Equipment name & Badger ID
Teaser Blurb
Cleanliness
Location
Plasma Mode Etching , Reactive Ion Etching (RIE) , Downstream/Remote Plasma Resist Removal
Samco PC300 Plasma Etch System samco
The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch (similar to Drytek 2) or Downstream plasma modes
Flexible
SNF Cleanroom Paul G Allen L107
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Gasonics Aura Asher gasonics
The Gasonics Aura Asher is an automated down stream microwave plasma system used for stripping photoresist of 4 inch wafers in the 'clean' cleanliness group.
Clean , Semiclean
SNF Cleanroom Paul G Allen L107
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Matrix Plasma Resist Strip matrix
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
Flexible
SNF Cleanroom Paul G Allen L107
Plasma Mode Etching , Reactive Ion Etching (RIE) , Downstream/Remote Plasma Resist Removal
Samco PC300 Plasma Etch System samco
The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch (similar to Drytek 2) or Downstream plasma modes
Flexible
SNF Cleanroom Paul G Allen L107
Plasma Mode Etching , Reactive Ion Etching (RIE) , Downstream/Remote Plasma Resist Removal
Samco PC300 Plasma Etch System samco
The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch (similar to Drytek 2) or Downstream plasma modes
Flexible
SNF Cleanroom Paul G Allen L107
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Gasonics Aura Asher gasonics
The Gasonics Aura Asher is an automated down stream microwave plasma system used for stripping photoresist of 4 inch wafers in the 'clean' cleanliness group.
Clean , Semiclean
SNF Cleanroom Paul G Allen L107
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Matrix Plasma Resist Strip matrix
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
Flexible
SNF Cleanroom Paul G Allen L107
Detail Tab
Processing Technique
Equipment name & Badger ID
Cleanliness
Primary Materials Etched
Other Materials Etched
Material Thickness Range
Substrate Size
Maximum Load (number of wafers)
Process Temperature Range
Gases
Notes
Plasma Mode Etching , Reactive Ion Etching (RIE) , Downstream/Remote Plasma Resist Removal
Samco PC300 Plasma Etch System samco
Flexible
Four 4" wafers or two 6" wafers and one 8" wafer
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Gasonics Aura Asher gasonics
Clean , Semiclean
25
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Wafers heated by lamps.
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Matrix Plasma Resist Strip matrix
Flexible
25
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.
Plasma Mode Etching , Reactive Ion Etching (RIE) , Downstream/Remote Plasma Resist Removal
Samco PC300 Plasma Etch System samco
Flexible
Four 4" wafers or two 6" wafers and one 8" wafer
Plasma Mode Etching , Reactive Ion Etching (RIE) , Downstream/Remote Plasma Resist Removal
Samco PC300 Plasma Etch System samco
Flexible
Four 4" wafers or two 6" wafers and one 8" wafer
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Gasonics Aura Asher gasonics
Clean , Semiclean
25
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Wafers heated by lamps.
Downstream/Remote Plasma Resist Removal , Downstream/Remote Plasma Etching
Matrix Plasma Resist Strip matrix
Flexible
25
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.