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All

The "All" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "All" category.

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Equipment name & Badger ID Training Required & Charges Cleanliness Lab Organization Location Notes
110°C Oven
oven110
110°C Oven Training All
SNF
SNF Cleanroom Paul G Allen L107

Bakes wafers with resist after the development, called post-bake.

90°C Oven
oven90
90°C Oven Training All
SNF
SNF Cleanroom Paul G Allen L107

Bakes wafers after resist coating.

ASML PAS 5500/60 i-line Stepper
asml
ASML PAS 5500/60 i-line Stepper Training All
SNF
SNF Cleanroom Paul G Allen L107

5:1 reducing stepper

Digital Instruments AFM Nanoscope Dimension 3000
afm2
Digital Instruments AFM Nanoscope Dimension 3000 Training All
SNF
SNF Exfab Paul G Allen 104 Stinson

Atomic Force Microscope. Step Profile

Drytek 100 Plasma Etcher
drytek2
Drytek 100 Plasma Etcher Training All
SNF
SNF Cleanroom Paul G Allen L107

Batch processing tool; 6 stacked electrodes; no clamp; wafers and pieces can be loaded directly on the grounded electrode

EV Group Contact Aligner
evalign
EV Group Contact Aligner Training All
SNF
SNF Cleanroom Paul G Allen L107

1:1 Contact Aligner.
Anodic Bond, backside align, including IR.

EVG 101 Spray Coater
evgspraycoat
EVG 101 Spray Coater Training All
SNF
SNF Cleanroom Paul G Allen L107

Spray coating of resists

Flexus 2320 Stress Tester
stresstest
Flexus 2320 Stress Tester Training All
SNF
SNF Cleanroom Paul G Allen L107
Headway Manual Resist Spinner
headway2
Headway Manual Resist Spinner Training All
SNF
SNF Cleanroom Paul G Allen L107

Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists

Heidelberg MLA 150
heidelberg
Heidelberg Training All
SNF
SNF Exfab Paul G Allen 104 Stinson

Direct Write

Heidelberg MLA 150 - 2
heidelberg2
Heidelberg Training All
SNF
SNF Cleanroom Paul G Allen L107

Direct Write

HMDS Vapor Prime Oven, YES
yes
YES Prime Oven Training All
SNF
SNF Cleanroom Paul G Allen L107

Two programs: Singe and HMDS prime or Singe only. No Resist allowed!

HMDS Vapor Prime Oven, YES2
yes2
Exfab YES2 HMDS oven training All
SNF
SNF Exfab Paul G Allen 104 Stinson

Singe and prime. No Resist allowed!

Karl Suss MA-6 Contact Aligner 1
karlsuss
Karl Suss MA-6 Contact Aligner 1 and 2 Training All
SNF
SNF Cleanroom Paul G Allen L107

1:1 Contact Aligner.
Backside align, including IR.

Karl Suss MA-6 Contact Aligner 2
karlsuss2
Karl Suss MA-6 Contact Aligner 1 and 2 Training All
SNF
SNF Cleanroom Paul G Allen L107

1:1 Contact Aligner.
Backside align.

Keyence Digital Microscope VHX-6000
keyence
Keyence Training All
SNF
SNF Exfab Paul G Allen 104 Stinson
Lakeshore Hall Measurement System
LakeshoreHall
Lakeshore Hall Measurement System training All
SNF
SNF Exfab Paul G Allen 151 Ocean
Laurell Manual Resist Spinner
laurell-R
Laurell Manual Resist Spinner Training All
SNF
SNF Cleanroom Paul G Allen L107

SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

LEI1500 Contactless Sheet Resistance Mapping
eddycurrent
LEI1500 Contactless Sheet Resistance Mapping Training All
SNF
SNF Exfab Paul G Allen 151 Ocean
Mask Scrubber
masksrub
Mask Scrubber Training All
SNF
SNF Cleanroom Paul G Allen L107

5 inch mask cleaning, water under pressure, no chemicals

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Equipment name & Badger ID Technique Cleanliness Primary Materials Etched Other Materials Etched Material Thickness Range Minimum Resolution Exposure Wavelength Mask Size Max Exposure Area Resist Developer Objective Separation Process Temperature Range Chemicals Gases Sample Size Limits Resolution Notes Substrate Size Substrate Type Maximum Load
110°C Oven
oven110
All
110 ºC
,
,
,
,
,
,
,
,
,
90°C Oven
oven90
All
90 ºC
,
,
,
,
,
,
,
,
ASML PAS 5500/60 i-line Stepper
asml
All
365 nm 5 inch
,
,
,
,
Digital Instruments AFM Nanoscope Dimension 3000
afm2
All
Drytek 100 Plasma Etcher
drytek2
All
6
EV Group Contact Aligner
evalign
All
350 - 450 nm 5 inch, 7 inch 5 inch mask = 4 inch, 7 inch mask = 6 inch
,
,
,
,
one piece or wafer
EVG 101 Spray Coater
evgspraycoat
All
,
,
,
,
1
Flexus 2320 Stress Tester
stresstest
All
,
,
,
,
,
,
,
,
1
Headway Manual Resist Spinner
headway2
All
,
,
,
,
,
,
,
,
,
one piece or wafer
Heidelberg MLA 150
heidelberg
All
405 nm
,
,
,
,
,
,
,
,
,
,
,
,
1
Heidelberg MLA 150 - 2
heidelberg2
All
375 nm
,
,
,
,
,
,
,
,
,
,
,
,
1
HMDS Vapor Prime Oven, YES
yes
All
150 ºC
,
,
,
,
,
,
,
,
HMDS Vapor Prime Oven, YES2
yes2
All
150 ºC
25
Karl Suss MA-6 Contact Aligner 1
karlsuss
All
365 nm 4 inch, 5 inch, 7 inch 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch
,
,
,
,
,
,
,
,
,
Karl Suss MA-6 Contact Aligner 2
karlsuss2
All
365 nm or 405 nm 4 inch, 5 inch, 7 inch 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch
,
,
,
,
,
,
,
,
,
Keyence Digital Microscope VHX-6000
keyence
All
,
,
,
,
,
,
,
,
Lakeshore Hall Measurement System
LakeshoreHall
All
100 μm - 1000 μm
-258 °C - 1000 °C
8 in wafer

Sensor Transducer Size is 14 mm diameter 

,
,
,
,
,
,
,
,
,
,
1 piece
Laurell Manual Resist Spinner
laurell-R
All
LEI1500 Contactless Sheet Resistance Mapping
eddycurrent
All
8 in wafer

Sensor Transducer Size is 14 mm diameter 

,
,
,
,
,
,
,
,
,
,
,
1 wafer(2" to 8")
Mask Scrubber
masksrub
All
5 inch

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