SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Etching
Etching is a broad term that is used to describe the removal of material from your sample. The sub categories may be helpful for narrowing down your search, and be aware that there may be more than one technique and/or tool that could be used for your process.
- Dry etching uses gaseous chemistries and plasma energy to etch materials from the sample.
- Wet etching uses liquid chemistries to etch materials from samples.
- Vapor etching uses HF Vapor to etch materials. It is primarily used to etch structures that would be damaged during the rinse and dry process in a standard wet etch.
| Equipment name & Badger ID | Location | Image | Overview | Primary Materials Etched | Link to Training |
|---|---|---|---|---|---|
|
Wet Bench Flexcorr 2 wbflexcorr-2 |
SNF Cleanroom Paul G Allen L107 |
 |
Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training | |
|
Wet Bench Flexcorr 3 wbflexcorr-3 |
SNF Cleanroom Paul G Allen L107 |
 |
This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible)...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training | |
|
Wet Bench Flexcorr 4 wbflexcorr-4 |
SNF Cleanroom Paul G Allen L107 |
 |
Wet Bench Flexcorr 1and2 and 3and4 Training | ||
|
Xactix Xenon Difluoride Etcher xactix |
SNF Cleanroom Paul G Allen L107 |
 |
The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher. XeF2 is a vapor...Read more |
Xactix Xenon Difluoride Etcher Training |
