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Etching

Etching is a broad term that is used to describe the removal of material from your sample. The sub categories may be helpful for narrowing down your search, and be aware that there may be more than one technique and/or tool that could be used for your process. 

  • Dry etching uses gaseous chemistries and plasma energy to etch materials from the sample. 
  • Wet etching uses liquid chemistries to etch materials from samples. 
  • Vapor etching uses HF Vapor to etch materials. It is primarily used to etch structures that would be damaged during the rinse and dry process in a standard wet etch.
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Equipment name & Badger ID Location Image Overview Primary Materials Etched Link to Training
Wet Bench Flexcorr 2
wbflexcorr-2
SNF Cleanroom Paul G Allen L107

Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Wet Bench Flexcorr 3
wbflexcorr-3
SNF Cleanroom Paul G Allen L107

This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible)...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Wet Bench Flexcorr 4
wbflexcorr-4
SNF Cleanroom Paul G Allen L107
Wet Bench Flexcorr 1and2 and 3and4 Training
Xactix Xenon Difluoride Etcher
xactix
SNF Cleanroom Paul G Allen L107

The Xactix e-1 is a XeF2 (xenon difluoride) isotropic silicon etcher.  XeF2 is a vapor...Read more

Xactix Xenon Difluoride Etcher Training

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