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Piranha Cleaning

Piranha Cleaning is used to refer to mixtures of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). There are various ratios and temperatures that can be used depending on what is being cleaned off and what your substrate can withstand. Pirhana cleans are often used to remove reisist, clean resist residues and post-etch sidewall polymer residues. Piranha cleans will also remove metals.

The specific wet bench you will need to use will depend on your substrate material, substrate size, other materials on your substrate, and the contamination level of your part. (For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page).

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Cleanliness Equipment name & Badger ID Location Image Overview Link to Training
Clean Wet Bench Clean_res-piranha
wbclean_res-piranha
SNF Cleanroom Paul G Allen L107

The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training
Flexible Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexcorr 2
wbflexcorr-2
SNF Cleanroom Paul G Allen L107

Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical (corrosives) processing of standard (like...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexcorr 3
wbflexcorr-3
SNF Cleanroom Paul G Allen L107

This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible) materials like glass, wafer pieces,...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexcorr 4
wbflexcorr-4
SNF Cleanroom Paul G Allen L107
Wet Bench Flexcorr 1and2 and 3and4 Training