Piranha Cleaning is used to refer to mixtures of sulfuric acid (H2SO4) and hydrogen peroxide (H2O2). There are various ratios and temperatures that can be used depending on what is being cleaned off and what your substrate can withstand. Pirhana cleans are often used to remove reisist, clean resist residues and post-etch sidewall polymer residues. Piranha cleans will also remove metals.
The specific wet bench you will need to use will depend on your substrate material, substrate size, other materials on your substrate, and the contamination level of your part. (For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page).
Cleanliness | Equipment name & Badger ID | Location | Image | Overview | Link to Training |
---|---|---|---|---|---|
Clean |
Wet Bench Clean_res-piranha wbclean_res-piranha |
SNF Cleanroom Paul G Allen L107 |
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The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more |
Wet Bench Clean Piranha/HF/Phosphoric Training |
Flexible |
Wet Bench Flexcorr 1 wbflexcorr-1 |
SNF Cleanroom Paul G Allen L107 |
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The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
Wet Bench Flexcorr 2 wbflexcorr-2 |
SNF Cleanroom Paul G Allen L107 |
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Wet Bench flexcorr-2 , part of Wet Bench wbflexcorr-1 and -2, is for wet chemical (corrosives) processing of standard (like...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
Wet Bench Flexcorr 3 wbflexcorr-3 |
SNF Cleanroom Paul G Allen L107 |
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This wet bench is used for wet chemical (corrosives) processing of standard and non-standard (flexible) materials like glass, wafer pieces,...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
Wet Bench Flexcorr 4 wbflexcorr-4 |
SNF Cleanroom Paul G Allen L107 |
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Wet Bench Flexcorr 1and2 and 3and4 Training |