Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Techniques
Overview
Processing Techniques
Projects
Nano Nuggets
Processes
Runsheets
Safety
Overview
Safety Policies
Safety Training
SDS
Camera Policies
Training
Overview
Training Calendar
Training Course Online
Training Shadowing Form
Training Videos
Materials
Overview
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Useful Links
Wafer Dopant and Resistivity Specs
SNF Badger Accounts
Events
Discussion Lists
External Links
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Table
Characterization Equipment
CVD Equipment
Doping Equipment
Dry Etch Equipment
Metallization Equipment
Photolithography Equipment
Wet Bench Equipment
Materials
Overview
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Boron trichloride
Chemical Formula:
BCl
3
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
Oxford III-V etcher
Ox-35
Flexible
SNF Cleanroom Paul G Allen L107
GaAs
AlGaN
AlInP
GaN
InGaP
InSb
Ar
BCl
3
CH
4
Cl
2
H
2
HBr
N
2
O
2
SF
6
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
Flexible
SNF Cleanroom Paul G Allen L107
Al
Various
GaN
Ar
BCl
3
CF
4
CH
4
Cl
2
N
2
O
2
SF
6
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
