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Stanford Nanofabrication Facility
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. ANY shadowing must be coordinated with SNF staff first.
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Boron trichloride
Chemical Formula:
BCl
3
Gases Equipment Tabs
Etch Equipment Table
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
Gases
Oxford III-V etcher
Ox-35
Flexible
SNF Cleanroom Paul G Allen L107
GaAs
AlGaN
AlInP
GaN
InGaP
InSb
Ar
BCl
3
CH
4
Cl
2
H
2
HBr
N
2
O
2
SF
6
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
Flexible
SNF Cleanroom Paul G Allen L107
Al
Various
GaN
Ar
BCl
3
CF
4
CH
4
Cl
2
N
2
O
2
SF
6
Anneal/Oxidation Equipment Table
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
