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Silicon Oxide Wet Etching

Mixtures of diluted hydrofluoric acid are typically used to etch silicon oxides.

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Equipment name & Badger ID Location Image Overview Primary Materials Etched Link to Training
Wet Bench Clean_res-hf
wbclean_res-hf
SNF Cleanroom Paul G Allen L107

The wbclean-res-hf is part of the Wet Bench Clean_res-piranha,-hf, and -hotphos bench. This bench (semi-automated)...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training
Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training