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Photoresist

Preferred Short Name:

Resist

Equipment Tabs

Annealing & Oxidation Equipment

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Deposition Equipment

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Etching Equipment

Etch Equipment
Equipment name & Badger ID	Cleanliness	Location	Primary Materials Etched	Other Materials Etched
AMAT P5000 Etcher p5000etch	Clean Clean (Ge) Semiclean	SNF Cleanroom Paul G Allen L107	Si based materials Si SiGe SiN SiO₂ SiON Poly Silicon	C C C dimethylpolysiloxane poly(p-xylylene) SiC Ti Various C-based W WSi₂ PI Resist Ti Tungsten
Gasonics Aura Asher gasonics	Clean Semiclean	SNF Cleanroom Paul G Allen L107	Resist	PI
Matrix Plasma Resist Strip matrix	Flexible	SNF Cleanroom Paul G Allen L107	Resist	PI
Plasmaetch PE-50 plasma-etch	Flexible	SNF Exfab Paul G Allen 155 Mavericks	Resist
Samco PC300 Plasma Etch System samco	Flexible	SNF Cleanroom Paul G Allen L107	Resist	Si based materials dimethylpolysiloxane Si SiN SiO₂ SiON Various polymers PI Poly Silicon
Technics Asher technics	Flexible	SNF Cleanroom Paul G Allen L107	Resist	dimethylpolysiloxane poly(p-xylylene) PI
Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	SNF Cleanroom Paul G Allen L107	Metals Al Au Cr Si SiO₂ Resist	GaAs SiN Ti W

Projects