Aluminum and Titanium and Tungsten Wet Etching
Hydrogen peroxide mixtures are used for etching common CMOS metals like Al, Ti and W.
| Equipment name & Badger ID | Location | Image | Overview | Primary Materials Etched | Link to Training |
|---|---|---|---|---|---|
|
Wet Bench CMOS Metal (wbclean3) wbclean3 |
SNF Cleanroom Paul G Allen L107 |
 |
This part of the bench (right side) is the Wet Bench CMOS Metal (wbclean3). It...Read more |
Wet Bench CMOS Metal (wbclean3) Training | |
|
Wet Bench Flexcorr 1 wbflexcorr-1 |
SNF Cleanroom Paul G Allen L107 |
 |
The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
