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Aluminum and Titanium and Tungsten Wet Etching

Hydrogen peroxide mixtures are used for etching common CMOS metals like Al, Ti and W.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & Badger ID	Teaser Blurb	Cleanliness	Location
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Aluminum and Titanium and Tungsten Wet Etching	Wet Bench CMOS Metal (wbclean3) wbclean3		Semiclean	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1		Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & Badger ID	Cleanliness	Chemicals	Primary Materials Etched	Other Materials Etched	Material Thickness Range	Substrate Size	Maximum Load (number of wafers)	Process Temperature Range	Notes
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Aluminum and Titanium and Tungsten Wet Etching	Wet Bench CMOS Metal (wbclean3) wbclean3	Semiclean	20:1 BOE 50:1 HF 6:1 BOE Al-Etch Ti-Etch W-etch	Al Ti W			3" 4" 6"	25 wafers		Al, Ti, or W wet etching or oxide etching
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching	Wet Bench Flexcorr 1 wbflexcorr-1	Flexible	Acids Bases Gold Etchant H₃PO₄ 20:1 BOE 50:1 HF 6:1 BOE 9:1 Piranha Al-Etch Chrome Etch KOH SC1 SC2	Metals Al Au Cr Si SiO₂ Resist	GaAs Si3N4 Ti W		Pieces 2" 3" 4" 6"			Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.