SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Aluminum and Titanium and Tungsten Wet Etching
Hydrogen peroxide mixtures are used for etching common CMOS metals like Al, Ti and W.
| Equipment name & Badger ID | Location | Image | Overview | Primary Materials Etched | Link to Training |
|---|---|---|---|---|---|
|
Wet Bench CMOS Metal (wbclean3) wbclean3 |
SNF Cleanroom Paul G Allen L107 |
 |
This part of the bench (right side) is the Wet Bench CMOS Metal (wbclean3). It...Read more |
Wet Bench CMOS Metal (wbclean3) Training | |
|
Wet Bench Flexcorr 1 wbflexcorr-1 |
SNF Cleanroom Paul G Allen L107 |
 |
The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
