Acids are used typically to etch or clean substrates.
Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
---|---|---|---|---|---|
Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only. |
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Wet Bench Flexcorr 2 wbflexcorr-2 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. 3 hot pots available. GaAs allowed in personal labware only |
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Wet Bench Flexcorr 3 wbflexcorr-3 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot Plate available. GaAs not allowed. |
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Wet Bench Flexcorr 4 wbflexcorr-4 |
Wet Bench Flexcorr 1and2 and 3and4 Training 2.25 hours |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. CTB. Labware for "clean" KOH or TMAH etching available. GaAs not allowed. |