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Wet Bench Decontamination (wbdecon)

New Normal Changes

About PPE: alcohol wipe down before and after each use. In addition, face shields will be placed in the steamer for 1 1/2 hours. Aprons will be user owned, not shared.

Overview

This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of 3", 4" or 6 " KOH-etched silicon wafers before being allowed back into the clean equipment group.

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Process Temperature Range: 
Notes: 

KOH or wafersaw or post-cmp decontamination

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Primary Trainer: 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Please read the 'KOH decontamination at wbdecon' part of this page.
  3. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper.
  4. Contact the primary trainer: .

Operating Instructions