SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
This part of the bench (left side), wbdecon, has one HCl bath, dump rinser, and SRD for the decontamination of 3", 4" or 6 " KOH-etched silicon wafers before being allowed back into the clean equipment group.
KOH or wafersaw or post-cmp decontamination