Mask Scrubber (masksrub)
Overview
Manual mask cleaner for one 5 inch mask, water under pressure.
Cleanliness:
Processing Technique(s)
Capabilities and Specifications
Lithography Specifications
Mask Size:
Chemicals
Notes:
5 inch mask cleaning, water under pressure, no chemicals
Lab Organization, Location, and NEMO Information
Lab Organization:
Location:
NEMO Area:
SNF: Photolithography
NEMO ID:
masksrub
Training and Maintenance
Lab Facility:
Primary Trainer:
Backup Trainer(s):
Primary Maintenance:
Backup Maintenance:
Steps to become a tool user
-
Become a member of SNF.
- "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
- Contact the primary trainer: Uli Thumser
