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Wet Bench Clean 1 (wbclean-1)

New Normal Changes

About PPE: alcohol wipe down before and after each use. In addition, face shields will be placed in the steamer for 1 1/2 hours. Aprons will be user owned, not shared.


Wet Bench Clean 1 and 2

The Wet Bench Clean-1 and 2 is used for cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers prior to processing in diffusion furnaces, LPCVD furnaces or before metal deposition. The cleans performed here are high quality, final cleans which precede high temperature processing. To be processed at this station, wafers may not contain or have ever contained any metals, nor been exposed to equipment which may pose this contamination risk. This station contains 2 sets of SC1 (5:1:1 H2O:H2O2:NH4OH) for removal of trace organics and SC2 (5:1:1 H2O:H2O2:HCl) for removal of trace metal ions, HF tanks (50:1 HF, and 6:1 BOE) for oxide etching in addition to dump rinse and spin-rinse-dry modules.


Capabilities and Specifications

Process Temperature Range: 
Maximum Load: 

No resist allowed. Resist should have been removed at the wbclean_res-piranha.

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Training Charges: 
2.25 hours
Primary Trainer: 
Backup Trainer(s): 
Primary Maintenance: 
Backup Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Read all additional material on the SNF website concerning this tool Wet Bench Operating Instructions for WAFAB, and Additional Process Info.
  3. View the Plastic Tweezers Cleaning and the Metal Tweezer Cleaning movies as well.
  4. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form and the Wet Bench Checklist on clean room paper.
  5. Sign up for the relevant training scheduled in .
  6. Contact the primary trainer, , to schedule training. There will be a written test.

Operating Instructions