Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Resist | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|
SVG Develop Track 2 svgdev2 |
All |
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25 4 inch wafers | |||||||||
SVG Resist Coat Track 1 svgcoat |
All |
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25 4 inch wafers | |||||||||
SVG Resist Coat Track 2 svgcoat2 |
All |
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25 4 inch wafers | |||||||||
Technics Asher technics |
Flexible |
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Four 4" wafers to pieces, one 6" or 8" wafer | |||||||||
Tencor P2 Profilometer p2 |
Clean, Semiclean |
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1 | |||||||||
Wet Bench Flexcorr 1 wbflexcorr-1 |
|
Flexible |
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Wet Bench Flexcorr 2 wbflexcorr-2 |
Flexible |
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Wet Bench Flexcorr 3 wbflexcorr-3 |
Flexible |
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||||||||||
Wet Bench Flexible Solvents wbflexsolv |
Flexible |
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Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Flexible |
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Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Flexible |
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Wet Bench Miscellaneous wbmiscres |
Flexible |
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||||||||||
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
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25 4 inch wafers | ||||||||
Wet Bench Solvent Lithography lithosolv |
Flexible |
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Woollam woollam |
All |
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1 | |||||||||
Xactix Xenon Difluoride Etcher xactix |
All |
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1 |