SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
MF-26A developer
MF26A is a resist developer that is a chemical blend that, amongst other chemicals, contains surfactant and 2.4% TMAH.
| Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Chemicals | Notes |
|---|---|---|---|---|---|
|
SVG Develop Track 1 svgdev |
SVG Resist Develop tracks 1 and 2 Training 0.50 hours |
SNF Cleanroom Paul G Allen L107 |
|
Automatic development. |
|
|
SVG Develop Track 2 svgdev2 |
SVG Resist Develop tracks 1 and 2 Training 0.50 hours |
SNF Cleanroom Paul G Allen L107 |
|
Automatic development. |
|
|
Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training | SNF Cleanroom Paul G Allen L107 |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents! |
