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MF-26A developer

MF26A is a resist developer that is a chemical blend that, amongst other chemicals, contains surfactant and 2.4% TMAH.

Partial words okay.
Equipment name & Badger ID Training Required & Charges Cleanliness Location Chemicals Notes
SVG Develop Track 1
svgdev
SVG Resist Develop tracks 1 and 2 Training
0.50 hours
SNF Cleanroom Paul G Allen L107

Automatic development.

SVG Develop Track 2
svgdev2
SVG Resist Develop tracks 1 and 2 Training
0.50 hours
SNF Cleanroom Paul G Allen L107

Automatic development.

Wet Bench Miscellaneous
wbmiscres
Wet Bench Miscellaneous Photoresist Training SNF Cleanroom Paul G Allen L107

Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!

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