SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Resist Removal
There are many options available to remove resist from your substrate. Dry methods use plasma O2 to react with the resist, while wet methods use either solvents to dissolve the resist or oxidizing chemistries to react with the resist. For processes that are sensitive to resist residues, resist removal can consist of both a dry and a wet clean.
The cleaning method you will need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).
| Cleanliness | Equipment name & Badger ID | Location | Image | Overview | Link to Training |
|---|---|---|---|---|---|
| Clean, Semiclean |
Gasonics Aura Asher gasonics |
SNF Cleanroom Paul G Allen L107 |
 |
The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist of clean 4 inch wafers...Read more |
Gasonics Aura Asher Training |
| Flexible |
Matrix Plasma Resist Strip matrix |
SNF Cleanroom Paul G Allen L107 |
 |
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power,...Read more |
Matrix Plasma Resist Strip Training |
| Flexible |
Samco PC300 Plasma Etch System samco |
SNF Cleanroom Paul G Allen L107 |
 |
Samco Training | |
| Flexible |
Technics Asher technics |
SNF Cleanroom Paul G Allen L107 |
 |
Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma at ambient temperature. It is...Read more |
Technics Asher Training |
| Clean |
Wet Bench Clean_res-piranha wbclean_res-piranha |
SNF Cleanroom Paul G Allen L107 |
 |
The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more |
Wet Bench Clean Piranha/HF/Phosphoric Training |
| Flexible |
Wet Bench Flexcorr 1 wbflexcorr-1 |
SNF Cleanroom Paul G Allen L107 |
 |
The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more |
Wet Bench Flexcorr 1and2 and 3and4 Training |
| Flexible |
Wet Bench Flexible Solvents wbflexsolv |
SNF Cleanroom Paul G Allen L107 |
 |
The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more |
Wet Bench Flexible Solvents 1 and 2 Training |
| Flexible |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
SNF Cleanroom Paul G Allen L107 |
 |
The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects...Read more |
Wet Bench Flexible Solvents 1 and 2 Training |
| Flexible |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
SNF Cleanroom Paul G Allen L107 |
 |
The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more |
Wet Bench Flexible Solvents 1 and 2 Training |
| Clean (Ge), Semiclean, Flexible |
Wet Bench Resist Strip wbresstrip-1 |
SNF Cleanroom Paul G Allen L107 | Wet Bench Resist Strip |
