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Resist Removal

There are many options available to remove resist from your substrate. Dry methods use plasma O2 to react with the resist, while wet methods use either solvents to dissolve the resist or oxidizing chemistries to react with the resist. For processes that are sensitive to resist residues, resist removal can consist of both a dry and a wet clean. 

The cleaning method you will need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).

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Cleanliness Equipment name & Badger ID Location Image Overview Link to Training
Clean, Semiclean Gasonics Aura Asher
gasonics
SNF Cleanroom Paul G Allen L107

The Gasonics Aura Asher is an automated downstream microwave plasma system used for stripping photoresist of clean 4 inch wafers...Read more

Gasonics Aura Asher Training
Flexible Matrix Plasma Resist Strip
matrix
SNF Cleanroom Paul G Allen L107
photo of matrix in SNF cleanroom

The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power,...Read more

Matrix Plasma Resist Strip Training
Flexible Samco PC300 Plasma Etch System
samco
SNF Cleanroom Paul G Allen L107
Samco Training
Flexible Technics Asher
technics
SNF Cleanroom Paul G Allen L107

Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma at ambient temperature.  It is...Read more

Technics Asher Training
Clean Wet Bench Clean_res-piranha
wbclean_res-piranha
SNF Cleanroom Paul G Allen L107

The wbclean_res-piranha is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of the Clean Cleanliness Group for...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training
Flexible Wet Bench Flexcorr 1
wbflexcorr-1
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexcorr1, part of the Wet Bench 1and2, is a manual wet chemical station used for etching or...Read more

Wet Bench Flexcorr 1and2 and 3and4 Training
Flexible Wet Bench Flexible Solvents
wbflexsolv
SNF Cleanroom Paul G Allen L107

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more

Wet Bench Flexible Solvents 1 and 2 Training
Flexible Wet Bench Flexible Solvents 1
wbflexsolv-1
SNF Cleanroom Paul G Allen L107
Wet Bench Flexible Solvents

The Solvent Wet Bench is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert objects...Read more

Wet Bench Flexible Solvents 1 and 2 Training
Flexible Wet Bench Flexible Solvents 2
wbflexsolv-2
SNF Cleanroom Paul G Allen L107
Wet Bench Flexible Solvents

The Wet Bench Flexible Solvents is used for manual solvent cleaning of silicon wafers, tweezers, glassware, or any other inert...Read more

Wet Bench Flexible Solvents 1 and 2 Training