SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Objective Separation | Process Temperature Range | Gases | Sample Size Limits | Resolution Notes | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
Flexible |
|
|
|
800 °C - 1100 °C
|
, |
1x4" wafer or Copper/Nickel foil | ||||||||
AJA Evaporator aja-evap |
Flexible |
0 -
300 nm
|
|
|
|
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4"x3 or 6"x1 wafers or pieces | ||||||||
AJA2 Evaporator aja2-evap |
Semiclean |
0 -
300 nm
|
|
|
|
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4"x3 or 6"x1 wafers or pieces | ||||||||
Fiji 2 fiji2 |
Flexible |
1 Å -
50 nm
|
|
|
24 °C - 350 °C
|
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Lakeshore Hall Measurement System LakeshoreHall |
All |
100 μm -
1000 μm
|
|
|
-258 °C - 1000 °C
|
8 in wafer |
Sensor Transducer Size is 14 mm diameter |
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1 piece | ||||||
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
All |
|
|
|
|
8 in wafer |
Sensor Transducer Size is 14 mm diameter |
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1 wafer(2" to 8") | ||||||
micromanipulator6000 IV-CV probe station micromanipulator6000 |
All |
|
|
|
|
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1x4" wafer | ||||||||
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Flexible |
|
|
|
|
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Samco PC300 Plasma Etch System samco |
Flexible |
|
|
|
20 ºC
|
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Four 4" wafers or two 6" wafers and one 8" wafer | ||||||||
Savannah savannah |
Flexible |
1 Å -
50 nm
|
|
|
24 °C - 250 °C
|
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|||||||||
Woollam woollam |
All |
|
|
|
|
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