Skip to content Skip to navigation

Chemical Vapor Deposition (CVD)

Chemical Vapor Deposition, CVD, is a process by which films are deposited onto a substrate by the reaction between precursors at elevated temepratures and at atmomospheric or lower pressures.  Volatile precursors or their by-products are absorbed and react at the wafer surface to produce the desired films.  The  characteristics of the deposited film such as crystalinty, composition, quality, etc. are dependent on deposition conditions.  Films typically deposited using CVD processes are, but not limited to - silicon based compounds such as silicon, silicon dioxide, silicon nitride, slicon carbide, some Germanium based films and carbon based compounds. If the deposition occurs at atmospheric pressure, then the process is referred to as APCVD and if the process pressure is lower, it is LPCVD.  

Subscribe to
Equipment name & Badger ID Location Image Overview Materials Lab Supplied Link to Training
Aix-ccs
aix-ccs
SNF MOCVD Paul G Allen 213XA
aix-ccs MOCVD

Aixtron MOCVD for III-N semiconductors: InN, GaN, AlN, InGaN, InAlN,...

Aixtron MOCVD - III-N system training
Aix200
aix200
SNF MOCVD Paul G Allen 213XA
aix-200 MOCVD

Aixtron MOCVD for III-V and dilute nitride semiconductors: InAs, GaAs,...

Aixtron MOCVD - III-V system training
Aixtron Black Magic graphene CVD furnace
aixtron-graphene
SNF Exfab Paul G Allen L119 Año Nuevo

CVD-Graphene The Aixtron Black Magic CVD furnace is dedicated to...

Aixtron Black Magic graphene CVD furnace training
Epi2
epi2
SNF Cleanroom Paul G Allen L107
Applied Materials Centura Epi2  tool in SNF

Epi2 is the the first chamber on the tool and...

AMAT Centurion Epitaxial Training
First Nano carbon nanotube CVD furnace
cvd-nanotube
SNF Exfab Paul G Allen L119 Año Nuevo

CVD-Nanotube The First Nano CVD furnace is dedicated to carbon...

cvd-nanotube training
PlasmaTherm Shuttlelock PECVD System
ccp-dep
SNF Cleanroom Paul G Allen L107
PlasmaTherm Shuttlelock PECVD System Training
PlasmaTherm Versaline HDP CVD System
hdpcvd
SNF Cleanroom Paul G Allen L107
PlasmaTherm Versaline HDP CVD System Training
STS Plasma Enhanced CVD
sts
SNF Cleanroom Paul G Allen L107
STS Plasma Enhanced CVD Training
Teos2
teos2
SNF Cleanroom Paul G Allen L107

Teos2 furnace allows LPCVD deposition of silicon dioxide, using tetraethyl...

Teos Deposition Furnace Training
ThermcoLTO
thermcoLTO
SNF Cleanroom Paul G Allen L107

Silicon dioxide (SiO2) is deposited at between 300 and 450C...

Thermco LTO Deposition Furnace Training
ThermcoNitride
thermconitride1
SNF Cleanroom Paul G Allen L107

Silicon nitride (or nitride or Si3N4) is deposited at moderately...

Thermco Nitride Deposition Furnace Training
ThermcoPoly1
thermcopoly1
SNF Cleanroom Paul G Allen L107

Polycrystalline silicon (also called "poly-Si" or "poly") is deposited at...

Thermco Poly Deposition Furnace Training
ThermcoPoly2
thermcopoly2
SNF Cleanroom Paul G Allen L107

Same as ThermcoPoly1 but in the "flexible (gold-contaminated)" group.  ...

Thermco Poly Deposition Furnace Training
TylanBPSG
tylanbpsg
SNF Cleanroom Paul G Allen L107

Silicon dioxide (SiO2) is deposited at between 300 and 450C...

TylanBPSG Deposition Furnace Training

Project

Documentation

Pages