Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Techniques
Overview
Processing Techniques
Projects
Nano Nuggets
Processes
Runsheets
Safety & Policies
Overview
Lab Manual
1.0 General Policies
2.0 Getting Around
3.0 Safety for All
4.0 General Chemical Safety
5.0 Appendices
Safety Training
SDS
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Training Calendar
Training Course Online
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Useful Links
Wafer Dopant and Resistivity Specs
Lab Management System (Badger)
Events
Discussion Lists
External Links
Face shield cleaning using steamer
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Name Table
Characterization Equipment
CVD Equipment
Doping Equipment
Dry Etch Equipment
Metallization Equipment
Oxidation and Annealing Equipment
Photolithography Equipment
Wet Bench Equipment
Techniques
Overview
Processing Techniques
Projects
Nano Nuggets
Processes
Runsheets
Characterization
>
Hall measurement
Hall measurement
Technique Tabs
Main Tab
Items per page
5
10
20
40
50
60
- All -
Processing Techniques
Equipment name & Badger ID
Teaser Blurb
Cleanliness
Location
Sheet Resistance Measurement
,
Hall measurement
Lakeshore Hall Measurement System
LakeshoreHall
Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current
All
SNF Exfab Paul G Allen 151 Ocean
Detail Tab
Items per page
5
10
20
40
50
60
- All -
Processing Technique
Equipment name & Badger ID
Cleanliness
Material Thickness Range
Substrate Size
Maximum Load (number of wafers)
Process Temperature Range
Sheet Resistance Measurement
,
Hall measurement
Lakeshore Hall Measurement System
LakeshoreHall
All
100.00 μm
-
1000.00 μm
Pieces
1 piece
-258 °C - 1000 °C