Plasma Enhanced (PE) ALD

Plasma Enhanced ALD uses a down stream plasma system to deliver reactive plasma gases as a co-reactant to the metal-organic precursors.

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are:

www.plasma-ald.com: a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
www.atomiclimits.com: a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & Badger ID	Teaser Blurb	Cleanliness	Location
Plasma Enhanced (PE) ALD	Fiji 1 ALD fiji1	Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system.	Semiclean	SNF Cleanroom Paul G Allen L107
Plasma Enhanced (PE) ALD	Fiji 2 ALD fiji2	Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system. Fiji2 is currently classified as Flexible and is open to a wide range of metals and dielectrics.	Flexible	SNF Cleanroom Paul G Allen L107
Plasma Enhanced (PE) ALD	Fiji 3 ALD fiji3	The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma enabled atomic layer deposition system for deposition of restricted oxide films. The system is in the Flexible cleanliness category and allows a limited subset of gold contaminated substrates.	Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & Badger ID	Cleanliness	Materials Lab Supplied	Material Thickness Range	Substrate Size	Process Temperature Range	Gases	Notes
Plasma Enhanced (PE) ALD	Fiji 1 ALD fiji1	Semiclean	Metal oxides HfN Pt Ru SiO₂ Ta₂O₅ TaN TiN Various Dielectrics Alumina Hafnia Titania Zirconia	1.00 Å - 50.00 nm	Pieces 2" 3" 4" 6" 8"	24 °C - 350 °C	Ar H₂ N₂ NH₃ O₂
Plasma Enhanced (PE) ALD	Fiji 2 ALD fiji2	Flexible	Metal oxides Ga₂O₃ HfN In₂O₃ Ni_xO_y Pt Ru Si3N4 SiO₂ SnO₂ SrO Ta₂O₅ TiN Various Dielectrics Alumina Hafnia ITO Moly Oxide Titania Zirconia	1.00 Å - 50.00 nm	Pieces 2" 3" 4" 6" 8"	24 °C - 350 °C	Ar H₂ N₂ O₂
Plasma Enhanced (PE) ALD	Fiji 3 ALD fiji3	Flexible	SiO₂ Various Dielectrics Alumina Hafnia Titania	1.00 Å - 50.00 nm	Pieces 2" 3" 4" 6" 8"	24 °C - 350 °C	Ar H₂ N₂ NH₃ O₂	Restricted to non-conductive films only