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Atomic Layer Deposition (ALD)

Atomic Layer Deposition (ALD) is used for depositing thin (<50nm) films that are highly conformal. Most of the films deposited are metal oxides, although we do have Pt and Ru metal films available as well. We have both thermal only systems and plasma-assisted sytems available for labmembers to use. 

A couple of useful links that help navigate ALD research in general (not specific to the SNF) are:

  • www.plasma-ald.com: a website created by Dr. Mark Sowa that has a survey of plasma ALD literature
  • www.atomiclimits.com: a website created by Professor Erwin Kessels, Eindhoven University, that provides a dynamic discussion of the ALD landscape.
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Equipment name & Badger ID Location Image Overview Materials Lab Supplied Link to Training
Fiji 1
fiji1
SNF Cleanroom Paul G Allen L107
photo of Fiji1 in SNF Cleanroom

Fiji1 is a load-locked, plasma-enabled atomic layer deposition (ALD) system....

Fiji 1 and 2 Training
Fiji 2
fiji2
SNF Cleanroom Paul G Allen L107
photo of Fiji2 in SNF Cleanroom

Fiji2 is a load-locked, plasma-enabled atomic layer deposition (ALD) system....

Fiji 1 and 2 Training
Fiji 3
fiji3
SNF Cleanroom Paul G Allen L107
photo of Fiji3 in SNF Cleanroom

The Fiji3 ALD system from Cambridge Nanotech/Ultratech is a plasma...

Fiji 3 Training
MVD
mvd
SNF Cleanroom Paul G Allen L107

MVD is a molecular vapor deposition (MVD) system. It is...

MVD Training
Savannah
savannah
SNF Cleanroom Paul G Allen L107
photo of Savannah in SNF cleanroom

Savannah is a thermal atomic layer deposition (ALD) system. It...

Savannah Training