PVD is characterized by a process in which the material goes from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.
We aim to develop a process to thermally oxidize Cu and reliably grow Cu2O for the purpose of photonics integration, and ultimately probe the promise of this platform for nonlinear and quantum optics experiments
Our goal was to develop a process for sputtering of NVM-quality TiN using the new Lesker sputtering tool (Lesker-2) that resides inside the cleanroom. This tool can achieve the high-vacuum pressures necessary for TiN films with low levels of oxygen contamination.