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Aluminum Oxide
Preferred Short Name:
Alumina
Chemical Formula:
Al
2
O
3
Al
2
O
3
is commonly used as an electrical insulator.
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Fiji 1
fiji1
Semiclean
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Metal oxides
Al
2
O
3
HfN
HfO
2
Pt
Ru
SiO
2
Ta
2
O
5
TaN
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 2
fiji2
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Metal oxides
Al
2
O
3
Ga
2
O
3
HfN
HfO
2
In
2
O
3
In
x
Sn
y
O
z
MoO
3
Ni
x
O
y
Pt
Ru
SiN
SiO
2
SnO
2
SrO
Ta
2
O
5
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 3
fiji3
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Al
2
O
3
HfO
2
SiO
2
TiO
2
Various Dielectrics
Lesker Sputter
lesker-sputter
Flexible
SNF Exfab Paul G Allen 155A Venice
Ag
Al
Al
2
O
3
AlSi
Au
Co
Cr
Cu
Fe
In
x
Sn
y
O
z
Nb
Ni
Pd
Si
SiO
2
Ta
Ti
TiN
W
Lesker2 Sputter
lesker2-sputter
Semiclean
SNF Cleanroom Paul G Allen L107
1 μm
Ag
Al
Al
2
O
3
AlSi
Cr
Ge
In
x
Sn
y
O
z
Mo
Pd
Ru
Sc
Si
SiO
2
Sn
Ta
Ti
TiN
W
MVD
mvd
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Al
2
O
3
C
21
H
46
O
3
Si
C
9
H
23
NO
3
Si
HfO
2
HN(CH
2
CH
2
NH
2
)
2
Various
Various Dielectrics
Savannah
savannah
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Metal oxides
Al
2
O
3
Al
x
Zn
y
O
x
Ga
2
O
3
HfO
2
SnO
2
TiO
2
Various Dielectrics
ZnO
3
ZrO
2
Etch Equipment
Equipment name or Badger ID
Partial words okay.
No equipment matches all of the filter criteria you have set above.
Projects
SOP for Thin, low temperature ALD of Al2O3 and HfO2 with seed layer
-- (Nano Nugget)
ALD Dielectric Electrical Characterization- Final Report
-- (Report)
High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report
-- (Report)
MOSCAP Characterization of SNF ALD- Final Presentation
-- (Presentation)
ALD Process for Top-Gating 2D Materials
Low temperature ALD-Grown Superconducting Tunnel Contacts
