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Stanford Nanofabrication Facility
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Aluminum Oxide
Preferred Short Name:
Alumina
Chemical Formula:
Al
2
O
3
Al
2
O
3
is commonly used as an electrical insulator.
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
Deposition Equipment
Equipment name & Badger ID
Cleanliness
Location
Material Thickness Range
Approved Materials supplied by Lab
Fiji 1 ALD
fiji1
Semiclean
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Metal oxides
Al
2
O
3
HfN
HfO
2
Pt
Ru
SiO
2
Ta
2
O
5
TaN
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 2 ALD
fiji2
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Metal oxides
Al
2
O
3
Ga
2
O
3
HfN
HfO
2
In
2
O
3
In
x
Sn
y
O
z
MoO
3
Ni
x
O
y
Pt
Ru
Si3N4
SiO
2
SnO
2
SrO
Ta
2
O
5
TiN
TiO
2
Various Dielectrics
ZrO
2
Fiji 3 ALD
fiji3
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Al
2
O
3
HfO
2
SiO
2
TiO
2
Various Dielectrics
Lesker Sputter
lesker-sputter
Flexible
SNF Exfab Paul G Allen 155A Venice
Ag
Al
Al
2
O
3
AlSi
Au
Co
Cr
Cu
Fe
In
x
Sn
y
O
z
Nb
Ni
Pd
Si
SiO
2
Ta
Ti
TiN
W
Lesker2 Sputter
lesker2-sputter
Semiclean
SNF Cleanroom Paul G Allen L107
1 μm
Ag
Al
Al
2
O
3
AlSi
Cr
Ge
In
x
Sn
y
O
z
Mo
Pd
Ru
Sc
Si
SiO
2
Sn
Ta
Ti
TiN
W
MVD
mvd
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Al
2
O
3
C
21
H
46
O
3
Si
C
9
H
23
NO
3
Si
HfO
2
HN(CH
2
CH
2
NH
2
)
2
Various
Various Dielectrics
Savannah ALD
savannah
Flexible
SNF Cleanroom Paul G Allen L107
1 Å
-
50 nm
Metal oxides
Al
2
O
3
Al
x
Zn
y
O
x
Ga
2
O
3
HfO
2
SnO
2
TiO
2
Various Dielectrics
ZnO
3
ZrO
2
Projects
SOP for Thin, low temperature ALD of Al2O3 and HfO2 with seed layer
-- (Nano Nugget)
ALD Dielectric Electrical Characterization- Final Report
-- (Report)
High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report
-- (Report)
MOSCAP Characterization of SNF ALD- Final Presentation
-- (Presentation)
ALD Process for Top-Gating 2D Materials
Low temperature ALD-Grown Superconducting Tunnel Contacts
