Flexus 2320 Stress Tester stresstest |
Stress Tester Flexus 2320 Training |
All |
SNF Cleanroom Paul G Allen L107 |
|
Tystar Bank 2 Tube 5 B2T5 Clean Oxide Anneal |
Tystar Atmospheric Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
|
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training |
All |
SNF Cleanroom Paul G Allen L107 |
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists
|
Wet Bench Flexible Solvents wbflexsolv |
Wet Bench Flexible Solvents 1 and 2 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual solvent cleaning of substrates or resist removal.
|
Oven 90°C prebake oven90 |
Resist Prebake Oven 90°C Training |
All |
SNF Cleanroom Paul G Allen L107 |
Bakes wafers after resist coating.
|
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
Tystar Atmospheric Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
|
Critical Point Dryer Tousimis Automegasamdri-915B cpd |
Critical Point Dryer Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
CO2 drying after release of micromachined devices
|
Karl Suss MA-6 Contact Aligner karlsuss2 |
Contact Aligner Karl Suss MA-6 Training |
All |
SNF Cleanroom Paul G Allen L107 |
1:1 Contact Aligner.
Backside align.
|
Intlvac Evaporator Intlvac_evap |
Evaporator Intlvac Training |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
|
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Tystar Atmospheric Tube Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
|
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
|
Lakeshore Hall Measurement System LakeshoreHall |
Lakeshore Hall Measurement System training |
All |
SNF Exfab Paul G Allen 151 Ocean |
|
micromanipulator6000 IV-CV probe station micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
|
DISCO Wafer Saw DISCO wafersaw |
Wafersaw DISCO training |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
|
AJA Evaporator aja-evap |
Evaporator AJA training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
|
Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
|
First Nano carbon nanotube CVD furnace cvd-nanotube |
cvd-nanotube training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
|
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training |
Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For Sapphire clean: SC1, SC2.
For GaN template on Si or Sapphire: Piranha, SC1, SC2.
|
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training |
Flexible |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.
|