EPI (CVD), Low Pressure (LP) CVD, Hydrogen (H2) Annealing, Doping, Plasma Enhanced (PE) CVD |
AMAT Centurion Epitaxial System epi2 |
Clean |
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1 |
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Pre-Diffusion Clean |
N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr
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Rapid Thermal Annealing |
RTA AllWin 610 aw610_l |
Clean |
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1 wafer |
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Pre-Diffusion Clean |
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Rapid Thermal Annealing |
RTA AllWin 610 aw610_r |
Flexible |
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Oxide Growth (furnace), Annealing (furnace) |
Thermco3 Oxidation Furnace thermco 3 |
Clean |
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50 |
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Pre-Diffusion Clean |
Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
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Oxide Growth (furnace), Annealing (furnace) |
Thermco4 Oxidation Furnace thermco4 |
Flexible |
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50 |
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Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
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Annealing (furnace) |
Tylan9 Forming Gas Anneal Furnace tylan9 |
Flexible |
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50 |
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Any material that won't vaporize is okay. N2 and Ar annealing available.
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Annealing (furnace) |
Tylanfga Forming Gas Anneal Furnace tylanfga |
Semiclean |
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50 |
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Standard Metal Clean |
For standard metals deposited in Lesker2, Intlvac Sputter or Intlvac Evaporation only. N2 and Ar annealing available. Please contact staff for more information.
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