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Annealing & Oxidation

Annealing and Oxidation are processing techniques that are performed at high temperatures. Annealing is used to change the properties of a materials that are present on your sample. Oxidation done in furnaces grows the highest quality SiO2 available in the SNF.

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Equipment name & Badger ID Image Cleanliness Gases Substrate Size Process Temperature Range Material Thickness Range Maximum Load Notes
Aw610_l
aw610_l
Allwin 610 Rapid Thermal Process Systems photo
Clean
21 °C - 1150 °C
1 wafer
Aw610_r
aw610_r
SNF-Allwin 610 Rapid Thermal Process Systems
Flexible
21 °C - 1150 °C
Epi2
epi2
Applied Materials Centura Epi2  tool in SNF
Clean
600 °C - 1200 °C
50 Å - 3 μm
1

N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr

Thermco1
thermco1
Clean
700 °C - 1100 °C
25 Å - 2 μm
50

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

Thermco3
thermco 3
Clean
700 °C - 1100 °C
25 Å - 2 μm
50

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

Thermco4
thermco4
Flexible
700 °C - 1100 °C
25 Å - 2 μm
50

Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

Thermolyne
thermolyne
Flexible
25 °C - 1000 °C
25
Tylan9
tylan9
Flexible
250 °C - 1100 °C
50

Any material that won't vaporize is okay. N2 and Ar annealing available.

Tylanfga
tylanfga
Semiclean
250 °C - 800 °C
100 Å - 100 Å
50

For standard metals deposited in Lesker2, Intlvac Sputter or Intlvac Evaporation only. N2 and Ar annealing available. Please contact staff for more information.

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