Aix200 aix200 |
Aixtron MOCVD - III-V system training |
Flexible |
|
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.
|
Aw610_l aw610_l |
AllWin 610 RTA Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
|
Epi2 epi2 |
AMAT Centurion Epitaxial Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr
|
Teos2 teos2 |
Teos Deposition Furnace Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
Very conformal.
|
Thermco1 thermco1 |
Thermco Oxidation Furnaces Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
|
Thermco3 thermco 3 |
Thermco Oxidation Furnaces Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
|
ThermcoNitride thermconitride1 |
Thermco Nitride Deposition Furnace Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
Stociometric and low stress (~150mPa) programs available
|
ThermcoPoly1 thermcopoly1 |
Thermco Poly Deposition Furnace Training |
Clean |
|
SNF Cleanroom Paul G Allen L107 |
Standard polysilicon deposition at 620C. P and N doping available. Amorphous Si programs available.
|
ThermcoPoly2 thermcopoly2 |
Thermco Poly Deposition Furnace Training |
Flexible |
|
SNF Cleanroom Paul G Allen L107 |
Standard polysilicon deposition at 620C. P and N doping available.
|
TylanBPSG tylanbpsg |
TylanBPSG Deposition Furnace Training |
Clean, Semiclean |
|
SNF Cleanroom Paul G Allen L107 |
|