Gasonics Aura Asher gasonics |
Resist Removal Dry Gasonics Training |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Wafers heated by lamps.
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ASML PAS 5500/60 i-line Stepper asml |
Stepper ASML PAS 5500/60 i-line Training |
All |
SNF Cleanroom Paul G Allen L107 |
5:1 reducing stepper
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Wet Bench Clean 2 wbclean-2 |
Wet Bench Clean1and2 Training |
Clean |
SNF Cleanroom Paul G Allen L107 |
No resist allowed. Resist should have been removed at the wbclean_res-piranha
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Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
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Matrix Plasma Resist Strip matrix |
Matrix Plasma Resist Strip Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.
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EVG Contact Aligner evalign |
Contact Aligner EVG Training |
All |
SNF Cleanroom Paul G Allen L107 |
1:1 Contact Aligner.
Anodic Bond, backside align, including IR.
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SVG Develop Track 2 svgdev2 |
SVG Resist Develop tracks 1 and 2 Training |
All |
SNF Cleanroom Paul G Allen L107 |
Automatic development.
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Wet Bench Flexcorr 2 wbflexcorr-2 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot pots available. GaAs allowed in personal labware only
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Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training |
All |
SNF Cleanroom Paul G Allen L107 |
Isotropic Si etching; can be used for backside Si removal on small pieces
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Tylan9 Forming Gas Anneal Furnace tylan9 |
Forming Gas Anneal Furnace Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Any material that won't vaporize is okay. N2 and Ar annealing available.
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Lakeshore Hall Measurement System LakeshoreHall |
Lakeshore Hall Measurement System training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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micromanipulator6000 IV-CV probe station micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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DISCO Wafer Saw DISCO wafersaw |
Wafersaw DISCO training |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
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AJA Evaporator aja-evap |
Evaporator AJA training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
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Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
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First Nano carbon nanotube CVD furnace cvd-nanotube |
cvd-nanotube training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
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Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
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Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training |
Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For Sapphire clean: SC1, SC2.
For GaN template on Si or Sapphire: Piranha, SC1, SC2.
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Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training |
Flexible |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.
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