Equipment name & Badger ID | Technique | Cleaning Required | Cleanliness | Material Thickness Range | Materials Lab Supplied | Materials User Supplied | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Resist | Objective Separation | Process Temperature Range | Chemicals | Gases | Sample Size Limits | Resolution Notes | Substrate Size | Substrate Type | Maximum Load |
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110°C Oven oven110 |
All |
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110 ºC
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90°C Oven oven90 |
All |
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90 ºC
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Aix-ccs aix-ccs |
Special: See Notes | Clean (MOCVD) |
0 -
5 μm
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400 °C - 1300 °C
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4"x1, 2"X3, pieces | ||||||||||||
AJA Evaporator aja-evap |
Flexible |
0 -
300 nm
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4"x3 or 6"x1 wafers or pieces | |||||||||||||
Alphastep 500 Profilometer alphastep |
Flexible |
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1 | |||||||||||||
Blue M Oven bluem |
Flexible |
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0 °C - 430 °C
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Critical Point Dryer cpd |
Flexible |
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DISCO Wafer Saw DISCO wafersaw |
Flexible |
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1x4", 1x6" or 1x8" wafer, or pieces | |||||||||||||
Fiji 2 fiji2 |
Flexible |
1 Å -
50 nm
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24 °C - 350 °C
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Flexus 2320 Stress Tester stresstest |
All |
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1 | |||||||||||||
Headway Manual Resist Spinner headway2 |
All |
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one piece or wafer | |||||||||||||
Heidelberg MLA 150 heidelberg |
All |
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405 nm |
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1 | ||||||||||||
Heidelberg MLA 150 - 2 heidelberg2 |
All |
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375 nm |
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1 | ||||||||||||
HMDS Vapor Prime Oven, YES yes |
All |
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150 ºC
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Karl Suss MA-6 Contact Aligner 1 karlsuss |
All |
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365 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch |
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Karl Suss MA-6 Contact Aligner 2 karlsuss2 |
All |
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365 nm or 405 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch |
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Keyence Digital Microscope VHX-6000 keyence |
All |
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Lakeshore Hall Measurement System LakeshoreHall |
All |
100 μm -
1000 μm
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-258 °C - 1000 °C
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8 in wafer |
Sensor Transducer Size is 14 mm diameter |
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1 piece | |||||||||||
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
All |
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8 in wafer |
Sensor Transducer Size is 14 mm diameter |
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1 wafer(2" to 8") | |||||||||||
Lesker Sputter lesker-sputter |
Flexible |
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1 4 inch wafer, 1 6 inch wafer |