MOCVD is a chemical vapour deposition method using metal organics to produce single- or polycrystalline thin films. It is a process for growing crystalline layers to create complex semiconductor multilayer structures.
Equipment name & Badger ID | Materials Lab Supplied | Location | Link to Training |
---|---|---|---|
Aixtron MOCVD - III-N system aix-ccs |
SNF MOCVD Paul G Allen 213XA | Aixtron MOCVD - III-N system training | |
Aixtron MOCVD - III-V system aix200 |
SNF MOCVD Paul G Allen 213XA | Aixtron MOCVD - III-V system training | |
Aixtron MOCVD - III-V system aix200 |
SNF MOCVD Paul G Allen 213XA | Aixtron MOCVD - III-V system training |