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PMMA

Chemical Formula: 
(C5O2H8)n
Full Chemical Name (for In-Use Hazardous Chemicals card): 
Polymethyl methacrylate

PMMA can be used as a negative photoresist.

Partial words okay.
Equipment name & Badger ID Training Required & Charges Cleanliness Location Chemicals Notes
Headway Manual Resist Spinner
headway2
Resist Coat (manual) Headway Manual Training
1.00 hours
SNF Cleanroom Paul G Allen L107

Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists

Laurell Manual Resist Spinner
laurell-R
Laurell Manual Resist Spinner Training
1.00 hours
SNF Cleanroom Paul G Allen L107

SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

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