Equipment name & Badger ID | Technique | Cleaning Required | Cleanliness | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Resist | Objective Separation | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Aixtron MOCVD - III-V system aix200 |
Pre-Diffusion Clean | Flexible |
0 -
5 μm
|
|
|
300 °C - 800 °C
|
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4"x1 wafer or 2"x1 wafer or 4 pieces | |||||||||
AJA Evaporator aja-evap |
Flexible |
0 -
300 nm
|
|
|
|
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4"x3 or 6"x1 wafers or pieces | ||||||||||
AJA2 Evaporator aja2-evap |
Semiclean |
0 -
300 nm
|
|
|
|
, , , , , |
4"x3 or 6"x1 wafers or pieces | ||||||||||
AllWin 610 RTA aw610_l |
Pre-Diffusion Clean | Clean |
|
|
|
21 °C - 1150 °C
|
, , |
1 wafer | |||||||||
AllWin 610 RTA (aw610_r) aw610_r |
Flexible |
|
|
|
21 °C - 1150 °C
|
, , |
|||||||||||
Alphastep 500 Profilometer alphastep |
Flexible |
|
|
|
|
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1 | ||||||||||
ASML PAS 5500/60 i-line Stepper asml |
All |
|
|
365 nm | 5 inch |
|
|
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|||||||||
DISCO Wafer Saw DISCO wafersaw |
Flexible |
|
|
|
|
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1x4", 1x6" or 1x8" wafer, or pieces | ||||||||||
EV Group Contact Aligner evalign |
All |
|
|
350 - 450 nm | 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch |
|
|
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one piece or wafer | |||||||
EV Group Wafer Bonder evbond |
Flexible |
|
|
|
|
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|||||||||||
EVG 101 Spray Coater evgspraycoat |
All |
|
|
|
|
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1 | ||||||||||
Fiji 1 ALD fiji1 |
Semiclean |
1 Å -
50 nm
|
|
|
24 °C - 350 °C
|
, , |
|||||||||||
Fiji 2 ALD fiji2 |
Flexible |
1 Å -
50 nm
|
|
|
24 °C - 350 °C
|
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|||||||||||
Finetech Lambda flipchipbonder |
Flexible |
|
|
|
°C - 400 °C
|
, , , , , |
1 | ||||||||||
First Nano carbon nanotube CVD furnace cvd-nanotube |
Flexible |
|
|
|
800 °C - 1100 °C
|
, |
1x4" wafer or multiple pieces | ||||||||||
Flexus 2320 Stress Tester stresstest |
All |
|
|
|
|
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1 | ||||||||||
Headway Manual Resist Spinner headway2 |
All |
|
|
|
|
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one piece or wafer | ||||||||||
Heidelberg MLA 150 heidelberg |
All |
|
|
405 nm |
|
|
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1 | |||||||||
Heidelberg MLA 150 - 2 heidelberg2 |
All |
|
|
375 nm |
|
|
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1 | |||||||||
HMDS Vapor Prime Oven, YES yes |
All |
|
|
|
150 ºC
|
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