Equipment name & Badger ID | Training Required & Charges | Cleanliness | Lab Organization | Location | Notes |
---|---|---|---|---|---|
Fiji 2 fiji2 |
Fiji 1 and 2 Training | Flexible | SNF Cleanroom Paul G Allen L107 | ||
Heidelberg MLA 150 heidelberg |
Heidelberg Training | All | SNF Exfab Paul G Allen 104 Stinson |
Direct Write |
|
Heidelberg MLA 150 - 2 heidelberg2 |
Heidelberg Training | All | SNF Cleanroom Paul G Allen L107 |
Direct Write |
|
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Parylene Coater Training | Flexible | SNF Exfab Paul G Allen 155 Mavericks | ||
Samco PC300 Plasma Etch System samco |
Samco Training | Flexible | SNF Cleanroom Paul G Allen L107 | ||
Savannah savannah |
Savannah Training | Flexible | SNF Cleanroom Paul G Allen L107 | ||
Woollam woollam |
Woollam Training | All | SNF Cleanroom Paul G Allen L107 |
Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Exposure Wavelength | Objective Separation | Process Temperature Range | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Fiji 2 fiji2 |
Flexible |
1 Å -
50 nm
|
|
|
24 °C - 350 °C
|
, , , , , , , , , , , , |
||||||||
Heidelberg MLA 150 heidelberg |
All |
|
|
405 nm |
|
|
, , , , , , , , , , , , |
1 | ||||||
Heidelberg MLA 150 - 2 heidelberg2 |
All |
|
|
375 nm |
|
|
, , , , , , , , , , , , |
1 | ||||||
PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Flexible |
|
|
|
|
, , , , , , , , , , , , |
||||||||
Samco PC300 Plasma Etch System samco |
Flexible |
|
|
|
20 ºC
|
, , , , , , , , , , , , , |
Four 4" wafers or two 6" wafers and one 8" wafer | |||||||
Savannah savannah |
Flexible |
1 Å -
50 nm
|
|
|
24 °C - 250 °C
|
, , , , , , , , , , , , |
||||||||
Woollam woollam |
All |
|
|
|
|
, , , , , , , , , , , , , |
1 |