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SNF and ExFab Characterization and Testing Equipment

The SNF and ExFab facilities provide characterization equipment that is used for fabrication process development and analysis as well as some electrical device characterization.

Characterization and Testing Equipment Summary

Processing Techniques Equipmentsort descending Cleanliness Substrate Size Notes
Atomic Force Microscopy (AFM) Asylum AFM (afm-asylum) Flexible
Characterization CytoViva HSI (cytoviva) Flexible
Film Stress Measurement Flexus 2320 Stress Tester (stresstest) All
Characterization Jasco UV-Vis-NIR (jasco-uv-vis-nir) Flexible
Microscopy Keyence Digital Microscope VHX-6000 (keyence) All
Sheet Resistance Measurement, Hall measurement Lakeshore Hall Measurement System (LakeshoreHall) All
Sheet Resistance Measurement LEI1500 Contactless Sheet Resistance Mapping (eddycurrent) All
Dynamic Light Scattering Malvern Dynamic Light Scattering (DLS) Zetasizer (malvern-dls) Flexible
Characterization micromanipulator6000 IV-CV probe station (micromanipulator6000) All
Reflectometry Nanospec 210XP (nanospec2) All

Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Å
Reflectometry Nanospec 3 (nanospec3) All
Step Profile Profilometer Alphastep 500 (alphastep) Flexible

500Å to 300µm
Step Profile Profilometer AlphaStep D-300 (alphastep2) Flexible
Sheet Resistance Measurement Prometrix Resistivity Mapping System (prometrix) All

3 Probe Heads for different cleanliness groups.
Reflectometry Reflectance Spectrometer Filmetrics F40 (filmetrics) All
Microscopy SEM -Zeiss Merlin (sem-merlin) All
Optical Profilometer, Interferometry Sensofar S-neox (s-neox) All

non contact 3D optical profiling
Characterization SPF Measurement Bench ()
Step Profile Tencor P2 Profilometer (p2) Clean, Semiclean

Step height measurement range 500 Å to 80 µm
Ellipsometry Woollam (woollam) All
Last modified: 30 Apr 2020